Mr. Yosuke Kojima
at Toppan Printing Co Ltd
SPIE Involvement:
Author
Publications (20)

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Semiconductors, Lithography, Reticles, Metrology, Scanning electron microscopy, Photomasks, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Radium

PROCEEDINGS ARTICLE | April 17, 2012
Proc. SPIE. 8352, 28th European Mask and Lithography Conference
KEYWORDS: Reticles, Metrology, Scanners, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Integrated circuit design, Airborne remote sensing, Phase shifts

PROCEEDINGS ARTICLE | April 16, 2012
Proc. SPIE. 8352, 28th European Mask and Lithography Conference
KEYWORDS: Lithography, Reticles, Metrology, Logic, Scanners, Scatterometry, Photomasks, Immersion lithography, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | April 4, 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Lithography, Reticles, Metrology, Calibration, Scanners, 3D metrology, Photomasks, Critical dimension metrology, Semiconducting wafers, Airborne remote sensing

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Silica, Opacity, Chemical vapor deposition, Photomasks, Excimer lasers, Critical dimension metrology, Radiation effects, 193nm lithography, Phase shifts

PROCEEDINGS ARTICLE | September 25, 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Lithography, Silica, Opacity, Silicon, Transmission electron microscopy, Photomasks, Excimer lasers, Radiation effects, 193nm lithography, Oxidation

Showing 5 of 20 publications
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