Julio R. Reyes
Senior Engineer at Toppan Photomasks Inc
SPIE Involvement:
Publications (4)

Proceedings Article | 17 December 2003 Paper
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518259
KEYWORDS: Photomasks, Extreme ultraviolet, Optical lithography, Etching, Extreme ultraviolet lithography, Reflectivity, Inspection, Reflectors, Lithography, Image processing

Proceedings Article | 17 December 2003 Paper
Eric Johnstone, Laurent Dieu, Christian Chovino, Julio Reyes, Dongsung Hong, Prakash Krishnan, Dianna Coburn, Christian Capella
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518262
KEYWORDS: Photomasks, Air contamination, Contamination, Pellicles, Reticles, Binary data, Glasses, Chemistry, Inspection, Environmental sensing

Proceedings Article | 17 December 2003 Paper
Gim Chen, Julio Reyes, James Wood, Ismail Kashkoush, Laurent Dieu, Richard Novak
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518247
KEYWORDS: Photomasks, Transmittance, Reticles, Chemistry, Photoresist processing, Binary data, Mask cleaning, Reflectivity, Photoresist materials, Particles

Proceedings Article | 28 August 2003 Paper
Julio Reyes, Curt Jackson, Laurent Dieu, William Bowers, Russell Stevens
Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504265
KEYWORDS: Reflectivity, Photomasks, Scanning probe microscopy, Chlorine, Photoresist processing, Etching, Phase shifts, Fluorine, Contamination, Phase measurement

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