Dr. Martin Eibelhuber
at EV Group
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | March 21, 2017
Proc. SPIE. 10144, Emerging Patterning Technologies
KEYWORDS: Lithography, Metrology, Calibration, Etching, Silicon, Manufacturing, Scanning electron microscopy, High volume manufacturing, Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers, Standards development

PROCEEDINGS ARTICLE | October 20, 2016
Proc. SPIE. 10032, 32nd European Mask and Lithography Conference
KEYWORDS: Metrology, Polymers, Ultraviolet radiation, Silicon, Manufacturing, Scanning electron microscopy, High volume manufacturing, Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 25, 2015
Proc. SPIE. 9375, MOEMS and Miniaturized Systems XIV
KEYWORDS: Lithography, Moire patterns, Ultraviolet radiation, Crystals, Silicon, Photonic crystals, Printing, Nanoimprint lithography, Optical alignment, Semiconducting wafers

PROCEEDINGS ARTICLE | February 1, 2008
Proc. SPIE. 6900, Quantum Sensing and Nanophotonic Devices V
KEYWORDS: Mid-IR, Refractive index, Mirrors, Continuous wave operation, Reflectivity, Laser damage threshold, Vertical cavity surface emitting lasers, Optical microcavities, Lead, Absorption

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