Mary Jane Brodsky
at GlobalFoundries
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 1 April 2008 Paper
Todd Bailey, Greg McIntyre, Bidan Zhang, Ryan Deschner, Sohan Mehta, Won Song, Hyung-Rae Lee, Yu Hue, MaryJane Brodsky
Proceedings Volume 6924, 69244F (2008) https://doi.org/10.1117/12.773102
KEYWORDS: Critical dimension metrology, Oxides, Reflectivity, Lithography, Semiconducting wafers, Photomasks, Chemical mechanical planarization, Silicon, Control systems, Etching

Proceedings Article | 12 May 2005 Paper
D. Gil, T. Bailey, D. Corliss, M. Brodsky, P. Lawson, M. Rutten, Z. Chen, N. Lustig, T. Nigussie, K. Petrillo, C. Robinson
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.598855
KEYWORDS: Semiconducting wafers, Immersion lithography, Scanners, Lithography, Critical dimension metrology, Semiconductor manufacturing, Manufacturing, Bacteria, Resistance, Polishing

Proceedings Article | 5 May 2005 Paper
Mary Jane Brodsky, Scott Halle, Vickie Jophlin-Gut, Lars Liebmann, Don Samuels, Gary Crispo, Kourosh Nafisi, Vijay Ramani, Ingrid Peterson
Proceedings Volume 5756, (2005) https://doi.org/10.1117/12.599865
KEYWORDS: Reticles, Inspection, Modulation, Resolution enhancement technologies, Optical proximity correction, Photomasks, Semiconducting wafers, Lithography, Manufacturing, Optical lithography

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