Dr. Gregory R. McIntyre
Manager Physical Optics Design
SPIE Involvement:
Author | Instructor
Publications (65)

Proceedings Article | 17 February 2021 Presentation
Proceedings Volume 11614, 116140C (2021) https://doi.org/10.1117/12.2587101
KEYWORDS: Mixed reality, Visual system, Virtual reality, Sensors, Scanners, Optical design, Navigation systems, Machine vision, Environmental sensing, Displays

Proceedings Article | 23 April 2018 Paper
Proceedings Volume 10583, 1058326 (2018) https://doi.org/10.1117/12.2297447
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Optical lithography, Semiconductors, Lithography, Semiconducting wafers, Metals, Manufacturing, Double patterning technology, Photomasks

Proceedings Article | 23 March 2018 Presentation + Paper
Stéphane Larivière, Christopher Wilson, Bogumila Kutrzeba Kotowska, Janko Versluijs, Stefan Decoster, Ming Mao, Marleen van der Veen, Nicolas Jourdan, Zaid El-Mekki, Nancy Heylen, Els Kesters, Patrick Verdonck, Christophe Béral, Dieter Van den Heuvel, Peter De Bisschop, Joost Bekaert, Victor Blanco, Ivan Ciofi, Danny Wan, Basoene Briggs, Arindam Mallik, Eric Hendrickx, Ryoung-han Kim, Greg McIntyre, Kurt Ronse, Jürgen Bömmels, Zsolt Tőkei, Dan Mocuta
Proceedings Volume 10583, 105830U (2018) https://doi.org/10.1117/12.2299389
KEYWORDS: Extreme ultraviolet, Optical lithography, Etching, Tin, Resistance, Metals, Semiconducting wafers, Critical dimension metrology, Photomasks, Copper

Proceedings Article | 21 March 2018 Presentation + Paper
Proceedings Volume 10583, 105830L (2018) https://doi.org/10.1117/12.2299639
KEYWORDS: Etching, Tin, SRAF, Optical lithography, Logic, Extreme ultraviolet, Photomasks, Stochastic processes, Scanning electron microscopy, Photoresist processing

Proceedings Article | 20 March 2018 Presentation + Paper
Ryoung-han Kim, Yasser Sherazi, Peter Debacker, Praveen Raghavan, Julien Ryckaert, Arindam Malik, Diederik Verkest, Jae Uk Lee, Werner Gillijns, Ling Ee Tan, Victor Blanco, Kurt Ronse, Greg McIntyre
Proceedings Volume 10588, 105880N (2018) https://doi.org/10.1117/12.2299335
KEYWORDS: Optical lithography, Extreme ultraviolet, Metals, Logic, Manufacturing, Lithography, Back end of line, Extreme ultraviolet lithography, New and emerging technologies

Showing 5 of 65 publications
Course Instructor
SC779: Polarization for Lithographers
The advent of ultra high numerical aperture (NA) systems enabled by immersion lithography has quickly brought polarization toward the top of the lithographer's list of concerns. A high index liquid between the resist and the last lens element allows better resolution by enabling larger angles of incidence, and thus more diffraction energy to couple into the resist. However various polarizing effects can become severe with these large angles of incidence. Most notably contrast from the TM component drops to near or below zero. Thus, the engineering of polarization states is becoming a necessary resolution enhancement technique. Consequently, understanding and controlling polarization throughout all components of the optical system become critical. This course provides the lithographer a basic knowledge of polarization and its application to high-NA imaging. After an introduction to the concept of polarization and the various ways it can be represented, both the benefits and limitations of its application to lithography are discussed. The polarizing effects of each component of the optical system are addressed, offering an understanding of their ultimate impact on imaging.
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