Dr. Scott D. Halle
at IBM Thomas J. Watson Research Ctr.
SPIE Involvement:
Publications (51)

Proceedings Article | 21 November 2023 Presentation + Paper
Proceedings Volume 12751, 127510M (2023) https://doi.org/10.1117/12.2689665
KEYWORDS: SRAF, Extreme ultraviolet, Optical lithography, Resolution enhancement technologies, Opacity, Extreme ultraviolet lithography, Optical proximity correction, Line edge roughness, Semiconducting wafers, Printing

SPIE Journal Paper | 8 November 2022 Open Access
JM3, Vol. 21, Issue 04, 041604, (November 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.4.041604
KEYWORDS: Reactive ion etching, Neural networks, Surface plasmons, Semiconducting wafers, Optical lithography, Data modeling, Stochastic processes, Etching, Data processing, Chaos

Proceedings Article | 26 May 2022 Paper
Proceedings Volume 12053, 120531W (2022) https://doi.org/10.1117/12.2613785
KEYWORDS: Overlay metrology, Optical simulations, Calibration, Optical lithography, Optical filters, Metrology, Photomasks, Semiconductors, Semiconducting wafers, Data modeling

Proceedings Article | 26 May 2022 Presentation + Paper
Proceedings Volume 12051, 120510C (2022) https://doi.org/10.1117/12.2614296
KEYWORDS: Nickel, Photomasks, Extreme ultraviolet, SRAF, Phase shifts, Absorption, Diffraction, Optical lithography, Tantalum

Proceedings Article | 6 May 2020 Presentation + Paper
Proceedings Volume 11329, 113290B (2020) https://doi.org/10.1117/12.2551649
KEYWORDS: Neural networks, Surface plasmons, Reactive ion etching, Optical lithography, Semiconducting wafers, Data modeling, Metrology, Bayesian inference, Stochastic processes, Etching

Showing 5 of 51 publications
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