Dr. Mats Ekberg Profile

Dr. Mats Ekberg

at Uppsala University

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Author

Publications (10)

Proceedings Article | 12 May 2005 Paper

Some aspects on mechanisms responsible for contamination of optical components in DUV lithographic exposure tools

Hans Fosshaug, Gunnar Kylberg, Mats Ekberg

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600312

KEYWORDS: Molecules, Contamination, Adsorption, Diffusion, Deep ultraviolet, Oxides, Polarizability, Absorption, Ozone, Lithography

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Proceedings Article | 28 May 2004 Paper

DOE manufacture with the DUV SLM-based Sigma7300 laser pattern generator

Johan Karlsson, Charles Björnberg, Hans Fosshaug, Mikael Karlsson, Thomas Öström, Mats Ekberg, Peter Björnängen, Fredrik Nikolajeff

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535767

KEYWORDS: Diffractive optical elements, Diffraction, Spatial light modulators, Manufacturing, Optics manufacturing, Phase shift keying, Quartz, Refractive index, Photomasks, Stray light

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Proceedings Article | 28 May 2004 Paper

Airborne molecular contamination control in the micromirror SLM-based deep ultraviolet DUV SIGMA7300 laser pattern generator

Peter Bjornangen, Thomas Ostrom, Mats Ekberg, John Higley, David Ruede, Oleg Kishkovich, Hans Fosshaug, Thomas Utterback, Per-Uno Skotte

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535833

KEYWORDS: Photomasks, Deep ultraviolet, Molecules, Chemical analysis, Climatology, Molecular lasers, Spatial light modulators, Contamination, Optical components, Contamination control

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Proceedings Article | 24 May 2004 Paper

PSM alignment for Sigma7300: signal quality and resist effects from using the writing DUV laser light, spatial light modulator, and a CCD camera as a measurement tool for 2:nd layer alignment metrology

Thomas Ostrom, Mats Ekberg, Hans Fosshaug, Sten Lindau, Raoul Zerne

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.535830

KEYWORDS: Reflectivity, Spatial light modulators, Optical alignment, Deep ultraviolet, Charge-coupled devices, Image quality, Quartz, CCD cameras, Autoregressive models, Antireflective coatings

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Proceedings Article | 14 May 2004 Paper

Influence of writing strategy on CD control for the spatial light modulator-based Sigma7300 DUV laser pattern generator

Robert Eklund, Thomas Öström, Peter Hogfeldt, Per Askebjer, Hans Fosshaug, Adisa Bajramovic, Mats Ekberg, Johan Karlsson, Kezhao Xing, Jonathan Walford

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535821

KEYWORDS: Diffusion, Critical dimension metrology, Photomasks, Deep ultraviolet, Polymers, Printing, Spatial light modulators, Photoresist materials, Chemistry, Chemically amplified resists

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Proceedings Article | 28 August 2003 Paper

Laser pattern generator challenges in airborne molecular contamination protection

Swaraj Paul, James Hudzik, Per-Uno Skotte, Oleg Kishkovich, Tomas Utterback, Mats Ekberg

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504260

KEYWORDS: Photomasks, Mask making, Semiconducting wafers, Semiconductors, Climatology, Contamination, Lithography, Airborne laser technology, Manufacturing, Molecular lasers

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Proceedings Article | 28 December 1993 Paper

Proximity-compensated kinoforms directly written by e-beam lithography

Mats Ekberg, Fredrik Nikolajeff, M. Larsson, Sverker Hard, Paul Maker, Richard Muller

Proceedings Volume 10271, 1027109 (1993) https://doi.org/10.1117/12.170197

KEYWORDS: Computer generated holography, Electron beam lithography, Diffraction gratings, Manufacturing, Lithography, Polymethylmethacrylate, Fresnel lenses, Diffraction, Convolution, Deconvolution

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Proceedings Article | 2 March 1993 Paper

Proximity-compensated kinoforms directly written by electron beam lithography

Sverker Hard, J. Michael Larsson, Fredrik Nikolajeff, Mats Ekberg

Proceedings Volume 1732, (1993) https://doi.org/10.1117/12.140380

KEYWORDS: Diffraction gratings, Electron beam lithography, Manufacturing, Diffraction, Computer generated holography, Fresnel lenses, Point spread functions, Binary data, Photomasks, Convolution

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Proceedings Article | 5 January 1993 Paper

Proximity-compensated kinoforms directly written by e-beam lithography

Mats Ekberg, J. Michael Larsson, Fredrik Nikolajeff, Sverker Hard

Proceedings Volume 1718, (1993) https://doi.org/10.1117/12.138556

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Proceedings Article | 1 December 1991 Paper

Nd:YAG laser machining with multilevel resist kinoforms

Sverker Hard, Mats Ekberg, J. Michael Larsson, Aldo Bolle

Proceedings Volume 1527, (1991) https://doi.org/10.1117/12.48654

KEYWORDS: Computer generated holography, Diffraction, Photomasks, Nd:YAG lasers, Manufacturing, Laser drilling, Pulsed laser operation, Silicon, Semiconducting wafers, Laser energy

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Showing 5 of 10 publications

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