Dr. Peter van der Walle
at TNO
SPIE Involvement:
Publications (15)

Proceedings Article | 23 March 2020 Paper
Proceedings Volume 11323, 113231Z (2020) https://doi.org/10.1117/12.2552011
KEYWORDS: Extreme ultraviolet lithography, Imaging systems, Extreme ultraviolet, Diffraction gratings, Thermography, Reflectometry, Reflectivity, Mirrors, Diagnostics, Pellicles

Proceedings Article | 13 March 2018 Paper
Peter van der Walle, Esther Kramer, Rob Ebeling, Helma Spruit, Paul Alkemade, Silvania Pereira, Jacques van der Donck, Diederik Maas
Proceedings Volume 10585, 105852D (2018) https://doi.org/10.1117/12.2297188
KEYWORDS: Particles, Scattering, Scatterometry, Defect detection, Scanning electron microscopy, Scanners, Signal detection, Optical metrology, Semiconducting wafers

Proceedings Article | 16 October 2017 Paper
Edwin te Sligte, Michel van Putten, Freek Molkenboer, Peter van der Walle, Pim Muilwijk, Norbert Koster, Jeroen Westerhout, Peter Kerkhof, Bastiaan Oostdijck, Wouter Mulckhuyse, Alex Deutz
Proceedings Volume 10450, 1045027 (2017) https://doi.org/10.1117/12.2280356
KEYWORDS: Lifetime testing equipment, Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Scintillators, Pellicles, Reticles, Optical testing, EUV optics, Cameras, Photodiodes

Proceedings Article | 13 July 2017 Paper
Norbert Koster, Edwin te Sligte, Alex Deutz, Freek Molkenboer, Pim Muilwijk, Peter van der Walle, Wouter Mulckhuyse, Bjorn Nijland, Peter Kerkhof, Michel van Putten
Proceedings Volume 10454, 104540O (2017) https://doi.org/10.1117/12.2279025
KEYWORDS: Reticles, Extreme ultraviolet lithography, EUV optics, Scintillators, Scanners, Mirrors, Statistical analysis, Ruthenium, Extreme ultraviolet, Pellicles, Metrology, Contamination control

Proceedings Article | 26 June 2017 Paper
P. van der Walle, E. Kramer, J. C. van der Donck, W. Mulckhuyse, L. Nijsten, F. Bernal Arango, A. de Jong, E. van Zeijl, H. E. Spruit, J. van den Berg, G. Nanda, A. van Langen-Suurling, P. F. Alkemade, S. Pereira, D. Maas
Proceedings Volume 10329, 103294N (2017) https://doi.org/10.1117/12.2272414
KEYWORDS: Metrology, Manufacturing, Scanners, Latex, Optical spheres, Particles, Semiconducting wafers, Scanning electron microscopy, Signal detection, Speckle, Wafer-level optics, Silicon, Reticles, Inspection, Defect detection, Atomic force microscopy, Contamination control, Defect inspection, Optical microscopy, Particle contamination

Showing 5 of 15 publications
  • View contact details

Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top