Dr. Richard Schenker
Intel Fellow, Director Novel Patterning at Intel Corp
SPIE Involvement:
Publications (18)

Proceedings Article | 10 April 2024 Presentation
Proceedings Volume PC12953, PC129530G (2024) https://doi.org/10.1117/12.3010031
KEYWORDS: Metals, Directed self assembly, Extreme ultraviolet, Double patterning technology, Reliability, Data modeling, Optical lithography, Dielectric breakdown, Design and modelling, Data processing

Proceedings Article | 28 March 2014 Paper
J. Chawla, K. Singh, A. Myers, D. Michalak, R. Schenker, C. Jezewski, B. Krist, F. Gstrein, T. Indukuri, H. Yoo
Proceedings Volume 9054, 905404 (2014) https://doi.org/10.1117/12.2048599
KEYWORDS: Optical lithography, Dielectrics, Plasma, Metals, Critical dimension metrology, Etching, Copper, Lithography, Chemistry, Process control

Proceedings Article | 3 April 2010 Paper
Proceedings Volume 7641, 76410S (2010) https://doi.org/10.1117/12.849022
KEYWORDS: Photomasks, Optical lithography, Glasses, Design for manufacturing, Phase shifts, SRAF, Semiconducting wafers, Cadmium, Metals, Lithography

Proceedings Article | 7 March 2008 Paper
Proceedings Volume 6924, 69240I (2008) https://doi.org/10.1117/12.771677
KEYWORDS: Photomasks, Optical lithography, Glasses, Semiconducting wafers, SRAF, Cadmium, Phase shifts, Modulation, Image transmission, Etching

Proceedings Article | 7 March 2008 Paper
Proceedings Volume 6924, 69240E (2008) https://doi.org/10.1117/12.772116
KEYWORDS: Photomasks, Glasses, Optical lithography, Mask making, Near field, Semiconducting wafers, Resolution enhancement technologies, Imaging systems, Projection systems, Image transmission

Showing 5 of 18 publications
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