Mr. Seonho Lee Profile

Seonho Lee

at SAMSUNG Electronics Co., Ltd.

SPIE Involvement:

Author

Publications (3)

Proceedings Article | 28 April 2023 Paper

Improvement of CD uniformity using a new selective exposure focusing method

Seonho Lee, Jaewoong Sohn, Hyosung Lee, Jaehyung Jung, Youngjun Kim, Heehong Lee, HyoungHwa Jin, Harim Oh, Yongchan Kim, Maarten Boogaarts, Nataliya Nishchenko, Jin-Sung Kim, Noh-Kyoung Park, Sang-Jin Kim, Javier Loaiza Rivas, Jens Wustenfeld, Martin de Nivelle, Valerio Altini

Proceedings Volume 12494, 124940Y (2023) https://doi.org/10.1117/12.2657203

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Sensors, Scanners, High volume manufacturing, Lithography, Optical lithography, Distributed interactive simulations, Device simulation, Process control

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Proceedings Article | 27 April 2023 Presentation + Paper

Quantifying CD-SEM contact hole roughness and shape combined with machine learning-based pattern fidelity scores for process optimization and monitoring

Hyosung Lee, Seonho Lee, Hyungju Rah, Iksun Park, Jaeil Lee, Jaewoong Sohn, Yongchan Kim, Christoph Ehrlich, Philip Groeger, Sven Boese, Enrico Bellmann, Stefan Buhl, Seop Kim, Kang-san Lee

Proceedings Volume 12496, 124961P (2023) https://doi.org/10.1117/12.2657679

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Scanning electron microscopy, Image processing, Image restoration, Education and training, Contour extraction, Machine learning, Deformation, Finite element methods

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Proceedings Article | 26 May 2022 Poster + Paper

Reduction in on-product overlay random error using machine learning algorithm

Gilwoo Song, Sungchai Kim, Sungwon Park, Taeyoung Jo, Euiseok Kum, Jonghyun Hwang, Seonho Lee

Proceedings Volume 12053, 120531O (2022) https://doi.org/10.1117/12.2612771

KEYWORDS: Semiconducting wafers, Overlay metrology, Optical parametric oscillators, Scanners, Metrology, Machine learning, Neural networks, Error analysis, Semiconductors, Process control

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