Mr. Atsushi Tsuboi Profile

Atsushi Tsuboi

at Tokyo Electron Europe Ltd

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Publications (3)

Proceedings Article | 10 April 2024 Poster

Latest advances in EUV patterning for preparation of high numerical aperture EUV

Soichiro Okada, Arnaud Dauendorffer, Yuhei Kuwahara, Cong Que Dinh, Ken Ando, Atsushi Tsuboi, Kathleen Nafus, Nobuyuki Fukui, Philippe Foubert, Danilo De Simone

Proceedings Volume 12957, 129571W (2024) https://doi.org/10.1117/12.3010713

KEYWORDS: Extreme ultraviolet, Optical lithography, Etching, Plasma etching, Photoresist materials, Critical dimension metrology, Plasma, Metal oxides, Lithography, High volume manufacturing

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Proceedings Article | 22 November 2023 Poster

Holistic litho-etch approach towards high NA EUV challenges

Soichiro Okada, Arnaud Dauendorffer, Yuhei Kuwahara, Satoru Shimura, Philippe Foubert, Danilo De Simone, Cong Que Dinh, Ken Ando, Atsushi Tsuboi, Nobuyuki Fukui, Arame Thiam, Yannick Feurprier, Kathleen Nafus

Proceedings Volume PC12750, PC1275011 (2023) https://doi.org/10.1117/12.2687568

KEYWORDS: Extreme ultraviolet, Etching, Plasma etching, Photoresist materials, Optical lithography, Critical dimension metrology, Plasma, Metal oxides, Lithography, High volume manufacturing

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Proceedings Article | 1 May 2023 Poster + Paper

Recent advances in EUV patterning in preparation towards high-NA EUV

Seiji Nagahara, Arnaud Dauendorffer, Arame Thiam, Xiang Liu, Yuhei Kuwahara, Cong Que Dinh, Soichiro Okada, Shinichiro Kawakami, Hisashi Genjima, Noriaki Nagamine, Makoto Muramatsu, Satoru Shimura, Atsushi Tsuboi, Kathleen Nafus, Yannick Feurprier, Marc Demand, Rajesh Ramaneti, Philippe Foubert, Danilo De Simone, Geert Vendenberghe

Proceedings Volume 12498, 124981G (2023) https://doi.org/10.1117/12.2657432

KEYWORDS: Optical lithography, Extreme ultraviolet, Extreme ultraviolet lithography, Interfaces, Etching, Coating thickness, Lithography, Stochastic processes, Critical dimension metrology

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