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Nobuyuki Fukui
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Publications (3)
Proceedings Article | 10 April 2024 Poster
Latest advances in EUV patterning for preparation of high numerical aperture EUV
Proceedings Volume 12957, 129571W (2024) https://doi.org/10.1117/12.3010713
KEYWORDS: Extreme ultraviolet, Optical lithography, Etching, Plasma etching, Photoresist materials, Critical dimension metrology, Plasma, Metal oxides, Lithography, High volume manufacturing
Proceedings Article | 10 April 2024 Presentation + Paper
Pushing the boundaries of random logic metal patterning with low-n EUV single exposure
Syamashree Roy, Arame Thiam, Kaushik Sah, Yannick Feurprier, Nobuyuki Fukui, Kathleen Nafus, Kenichi Miyaguchi, Dieter Van den Heuvel, Balakumar Baskaran, Joost Bekaert, Andrew Cross, Mircea Dusa, Victor Blanco Carballo
Proceedings Volume 12953, 129530X (2024) https://doi.org/10.1117/12.3010868
KEYWORDS: Optical lithography, Semiconducting wafers, Logic, Scanning electron microscopy, Lithography, Design, Extreme ultraviolet
Proceedings Article | 22 November 2023 Poster
Holistic litho-etch approach towards high NA EUV challenges
Proceedings Volume PC12750, PC1275011 (2023) https://doi.org/10.1117/12.2687568
KEYWORDS: Extreme ultraviolet, Etching, Plasma etching, Photoresist materials, Optical lithography, Critical dimension metrology, Plasma, Metal oxides, Lithography, High volume manufacturing
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