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Dan N. Le
at Univ of Texas at Dallas
SPIE Involvement:
Author
Publications (3)
Proceedings Article | 30 April 2023 Presentation
Atomic layer deposition derived organic-inorganic hybrid EUV photoresists
Proceedings Volume 12498, 1249810 (2023) https://doi.org/10.1117/12.2658685
KEYWORDS: High volume manufacturing, Extreme ultraviolet lithography, Atomic layer deposition, Photoresist materials, Electron beam lithography, Thin films, Silicon, Resistance, Polymethylmethacrylate, Photoresist processing
Proceedings Article | 11 November 2022 Presentation
Low-energy electron exposure and reactive ion etching characteristics of hybrid EUV photoresist synthesized by molecular atomic layer deposition
Proceedings Volume PC12292, PC122920K (2022) https://doi.org/10.1117/12.2641794
KEYWORDS: Extreme ultraviolet lithography, Reactive ion etching, Photoresist materials, Atomic layer deposition, Electron beam lithography, Thin films, Photoresist developing, Etching, Semiconductors, Photons
Proceedings Article | 30 September 2021 Poster + Presentation
Photochemical study of metal infiltrated e-beam resist using vapor-phase infiltration for EUV applications
Proceedings Volume 11854, 118541C (2021) https://doi.org/10.1117/12.2601033
KEYWORDS: Extreme ultraviolet, Metals, Atomic layer deposition, Polymethylmethacrylate, Photoresist processing, FT-IR spectroscopy, Extreme ultraviolet lithography, Silicon, Resistance, Printed circuit board testing
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