Ms. Hosadurga Shobha Profile

Hosadurga Shobha

at IBM Corp

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Author

Publications (4)

Proceedings Article | 10 April 2024 Presentation

EUV double patterning solution for subtractive metal patterning at 18nm pitch

Christopher Penny, Koichi Motoyama, Hosadurga Shobha, Nabil Azad, Taesun Kim, Shravana Katakam, Johnsoo Kim, Joe Lee, Gideon Oyibo, Jaemyung Choi, Stuart Sieg, Tenko Yamashita, John Arnold, Kisik Choi

Proceedings Volume PC12958, (2024) https://doi.org/10.1117/12.3016092

KEYWORDS: Optical lithography, Extreme ultraviolet, Double patterning technology, Metals, Design and modelling, Ruthenium, Extreme ultraviolet lithography, Copper, Resistors, Resistance

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Proceedings Article | 27 April 2023 Presentation + Paper

Overlay performance in permanent bonded wafer integration schemes

Nathan Ip, Michael Belyansky, Christopher Netzband, Norifumi Kohama, Richard Johnson, Shobha Hosadurga, Jack Wong, John Arnold, Kisik Choi, Wai Kin Li, Indira Seshadri, Luciana Meli, Ilseok Son

Proceedings Volume 12496, 1249618 (2023) https://doi.org/10.1117/12.2654679

KEYWORDS: Wafer bonding, Semiconducting wafers, Distortion, Overlay metrology, Metrology, Scanners, Optical alignment, Silicon, Interfaces, Data modeling

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Proceedings Article | 2 July 2019 Presentation + Paper

Machine learning and hybrid metrology using scatterometry and LE-XRF to detect voids in copper lines

Dexin Kong, Koichi Motoyama, Abraham Arceo de la peña, Huai Huang, Brock Mendoza, Mary Breton, Gangadhara Raja Muthinti, Hosadurga Shobha, Liying Jiang, Juntao Li, James Demarest, John Gaudiello, Gauri Karve, Aron Cepler, Matthew Sendelbach, Susan Emans, Paul Isbester, Kavita Shah, Shay Wolfing, Avron Ger

Proceedings Volume 10959, 109590A (2019) https://doi.org/10.1117/12.2515257

KEYWORDS: Metrology, Machine learning, Scatterometry, Copper

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Proceedings Article | 25 March 2019 Presentation

Defectivity reduction in area selective atomic layer deposition by monolayer design (Conference Presentation)

Rudy Wojtecki, Magi Mettry, Noah Frederick Fine Nathel, Alexander Friz, Anuja De Silva, Noel Arellano, Hosadurga Shobha

Proceedings Volume 10960, 109600P (2019) https://doi.org/10.1117/12.2515465

KEYWORDS: Atomic layer deposition, Etching, Lithography, Self-assembled monolayers, Photomasks, Overlay metrology, Semiconductors, Hydrogen, Polymer thin films, Polymers

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