Dr. Joe Lee
at IBM Corp
SPIE Involvement:
Publications (7)

Proceedings Article | 10 April 2024 Presentation
Proceedings Volume PC12958, (2024) https://doi.org/10.1117/12.3016092
KEYWORDS: Optical lithography, Extreme ultraviolet, Double patterning technology, Metals, Design and modelling, Ruthenium, Extreme ultraviolet lithography, Copper, Resistors, Resistance

Proceedings Article | 13 June 2022 Presentation
Eric Liu, Joe Lee, Nicholas Joy, Yann Mignot, Angelique Raley, John Arnold, Peter Biolsi
Proceedings Volume PC12056, PC1205609 (2022) https://doi.org/10.1117/12.2615458
KEYWORDS: Optical lithography, Metals, Copper, Photomasks, Extreme ultraviolet, Etching, Double patterning technology, Dielectrics, Atomic layer deposition, Transition metals

Proceedings Article | 13 June 2022 Presentation
Proceedings Volume PC12056, PC120560A (2022) https://doi.org/10.1117/12.2614316
KEYWORDS: Optical lithography, Etching, Plasma etching, Plasma, Nanotechnology, Extreme ultraviolet, Line width roughness, Ions, Fin field effect transistors, Extreme ultraviolet lithography

Proceedings Article | 6 April 2020 Presentation + Paper
Proceedings Volume 11323, 113230V (2020) https://doi.org/10.1117/12.2551727
KEYWORDS: Line edge roughness, Lithography, Etching, Amorphous silicon, Extreme ultraviolet, Oxidation, Extreme ultraviolet lithography, Optical lithography, Scanning electron microscopy, Critical dimension metrology

SPIE Journal Paper | 31 July 2018
Angélique Raley, Joe Lee, Jeffrey Smith, Xinghua Sun, Richard Farrell, Jeffrey Shearer, Yongan Xu, Akiteru Ko, Andrew Metz, Peter Biolsi, Anton Devilliers, John Arnold, Nelson Felix
JM3, Vol. 18, Issue 01, 011002, (July 2018) https://doi.org/10.1117/12.10.1117/1.JMM.18.1.011002
KEYWORDS: Etching, Extreme ultraviolet, Line edge roughness, Optical lithography, Line width roughness, Silicon, Double patterning technology, Dielectrics, Metals, System on a chip

Showing 5 of 7 publications
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