Dr. Marc David Levenson
SPIE Involvement:
Author | Instructor
Publications (24)

SPIE Journal Paper | 1 April 2005
JM3, Vol. 4, Issue 02, 023006, (April 2005) https://doi.org/10.1117/12.10.1117/1.1897392
KEYWORDS: Photomasks, Diffraction, Imaging systems, Image acquisition, Electromagnetism, Spiral phase plates, Error analysis, Etching, Photoresist materials, Transmittance

Proceedings Article | 28 May 2004 Paper
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535652
KEYWORDS: Photomasks, Cadmium sulfide, Semiconducting wafers, Spiral phase plates, Critical dimension metrology, Optical vortices, Distortion, Optical lithography, Phase shifts, Scanning electron microscopy

SPIE Journal Paper | 1 April 2004
JM3, Vol. 3, Issue 02, (April 2004) https://doi.org/10.1117/12.10.1117/1.1683304
KEYWORDS: Spiral phase plates, Optical vortices, Photomasks, Cadmium, Imaging arrays, Scanning electron microscopy, Optical lithography, Critical dimension metrology, Lithography, Reticles

Proceedings Article | 17 December 2003 Paper
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.517872
KEYWORDS: Photomasks, Spiral phase plates, Critical dimension metrology, Cadmium, Scanning electron microscopy, Printing, Imaging arrays, Optical proximity correction, Floods, Nanoimprint lithography

Proceedings Article | 17 December 2003 Paper
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518104
KEYWORDS: Photomasks, Etching, Optical lithography, Lithography, Semiconducting wafers, Scanning electron microscopy, Photoresist processing, Reflectivity, Optical alignment, Scanners

Showing 5 of 24 publications
Course Instructor
SC119: Using Wavefront Engineering
This course covers the applications of wavefront engineering methods such as optical proximity correction, phase-shifting masks, and off-axis illumination to production of integrated circuits. The emphasis is on practical applications including patterning poly gates and contacts in general circuit geometries. Examples of currently available technologies will be cited.
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