Dr. Marc David Levenson
Contributing Editor at
SPIE Involvement:
Author | Instructor
Publications (24)

SPIE Journal Paper | April 1, 2005
JM3 Vol. 4 Issue 02
KEYWORDS: Photomasks, Diffraction, Imaging systems, Image acquisition, Electromagnetism, Spiral phase plates, Error analysis, Etching, Photoresist materials, Transmittance

PROCEEDINGS ARTICLE | May 28, 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Optical lithography, Distortion, Scanning electron microscopy, Optical vortices, Photomasks, Cadmium sulfide, Critical dimension metrology, Semiconducting wafers, Spiral phase plates, Phase shifts

SPIE Journal Paper | April 1, 2004
JM3 Vol. 3 Issue 02
KEYWORDS: Spiral phase plates, Optical vortices, Photomasks, Cadmium, Imaging arrays, Scanning electron microscopy, Optical lithography, Critical dimension metrology, Lithography, Reticles

PROCEEDINGS ARTICLE | December 17, 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Optical lithography, Etching, Scanners, Reflectivity, Scanning electron microscopy, Photomasks, Optical alignment, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | December 17, 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Cadmium, Scanning electron microscopy, Printing, Photomasks, Optical proximity correction, Nanoimprint lithography, Critical dimension metrology, Imaging arrays, Spiral phase plates, Floods

PROCEEDINGS ARTICLE | June 26, 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Reticles, Optical lithography, Optical vortices, Photomasks, Cadmium sulfide, Nanoimprint lithography, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Spiral phase plates

Showing 5 of 24 publications
Course Instructor
SC119: Using Wavefront Engineering
This course covers the applications of wavefront engineering methods such as optical proximity correction, phase-shifting masks, and off-axis illumination to production of integrated circuits. The emphasis is on practical applications including patterning poly gates and contacts in general circuit geometries. Examples of currently available technologies will be cited.
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