Dr. Nadav Wertsman
at Carl Zeiss SMS Ltd
SPIE Involvement:
Publications (6)

Proceedings Article | 2 April 2014 Paper
Proceedings Volume 9050, 905015 (2014) https://doi.org/10.1117/12.2048081
KEYWORDS: Semiconducting wafers, Photomasks, Scanners, Overlay metrology, Process control, Optical lithography, Silica, Data modeling, Reticles, Data acquisition

Proceedings Article | 9 November 2005 Paper
D. Chase, R. Kris, R. Katz, A. Tam, L. Gershtein, R. Falah, N. Wertsman
Proceedings Volume 5992, 59924N (2005) https://doi.org/10.1117/12.632439
KEYWORDS: Photomasks, Metrology, Edge roughness, Manufacturing, Reticles, Critical dimension metrology, Scanning electron microscopy, Integrated circuits, Line edge roughness, Photomask technology

Proceedings Article | 27 January 2005 Paper
Roman Kris, Ofer Adan, Aviram Tam, Albert Karabekov, Ovadya Menadeva, Ram Peltinov, Oren Zoran, Nadav Wertsman, Arcadiy Vilenkin
Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.575390
KEYWORDS: 3D metrology, Scanning electron microscopy, Monte Carlo methods, 3D modeling, Metrology, Optical lithography, Gallium, Semiconductors, Tolerancing

Proceedings Article | 27 January 2005 Paper
Roman Kris, Aviram Tam, Ram Peltinov, Ovadya Menadeva, Ofer Adan, Nadav Wertsman, Arcadiy Vilenkin
Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.575344
KEYWORDS: Metrology, Algorithm development, Process control, OLE for process control, Optical proximity correction, Scanning electron microscopy, Shape analysis, Optical lithography, Reticles

Proceedings Article | 20 August 2004 Paper
Roman Kris, Ovadya Menadeva, Aviram Tam, Ram Peltinov, Liraz Segal, Nadav Wertsman, Naftali Shcolnik, Gidon Gottlib, Arcadiy Vilenkin
Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557808
KEYWORDS: Metrology, Reticles, Scanning electron microscopy, Optical proximity correction, Algorithm development, Photomasks, Image segmentation, OLE for process control, Image processing, Feature extraction

Showing 5 of 6 publications
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