Dr. Roman Kris
Algorithm Developer at Applied Materials Inc
SPIE Involvement:
Author
Publications (17)

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Optical lithography, Inspection, Scanning electron microscopy, Printing, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 28, 2016
Proc. SPIE. 9782, Advanced Etch Technology for Nanopatterning V
KEYWORDS: Signal to noise ratio, Lithography, Optical lithography, Statistical analysis, Etching, Scanning electron microscopy, Line width roughness, Line edge roughness, Stochastic processes, Edge roughness

SPIE Journal Paper | October 1, 2014
JM3 Vol. 13 Issue 04
KEYWORDS: Metrology, Transmission electron microscopy, Semiconducting wafers, Scanning electron microscopy, Electron microscopes, Process control, 3D metrology, Diffractive optical elements, Oxides

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Oxides, Metrology, Diffractive optical elements, Calibration, Scanning electron microscopy, Transmission electron microscopy, 3D metrology, Process control, Semiconducting wafers

PROCEEDINGS ARTICLE | April 10, 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Metrology, Calibration, Silicon, Scanning electron microscopy, Smoothing, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Stochastic processes, Nanowires

PROCEEDINGS ARTICLE | April 4, 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Signal to noise ratio, Metrology, Statistical analysis, Visualization, Sensors, Calibration, Image acquisition, Interference (communication), Scanning electron microscopy, Critical dimension metrology

Showing 5 of 17 publications
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