Dr. Roman Kris
Algorithm Developer at Applied Materials Israel Ltd
SPIE Involvement:
Publications (19)

Proceedings Article | 20 March 2020 Presentation + Paper
R. Kris, G. Klebanov, I. Friedler, E. Frishman, S. Duvdevani Bar, J. Geva, V. Mirovoy, N. Teomim, D. Rathore, D. Rogers, J. Chess, B. Watson
Proceedings Volume 11325, 113251F (2020) https://doi.org/10.1117/12.2559399
KEYWORDS: Etching, Scanning electron microscopy, Process control, Critical dimension metrology, Metrology, Image processing, Signal processing, Shape analysis, Image classification, Image analysis, Machine learning

Proceedings Article | 8 April 2019 Paper
R. Kris, G. Klebanov, I. Schwarzband, E. Sommer, L. Gershtein, B. Mathew, E. Noifeld, S. Levy, R. Alkoken, O. Novak, H. Miroku, D. Rathore , S. Pastur, S. Duvdevani-Bar, T. Bar-On, I. Horikawa
Proceedings Volume 10959, 109592S (2019) https://doi.org/10.1117/12.2515233
KEYWORDS: Metrology, Critical dimension metrology, Process control, Scanning electron microscopy, Optical lithography, Algorithm development, Detection and tracking algorithms, Mathematical modeling, Image enhancement, Computer aided design

Proceedings Article | 13 March 2018 Paper
V. Verechagin, R. Kris, I. Schwarzband, A. Milstein, B. Cohen, A. Shkalim, S. Levy, D. Price, E. Bal
Proceedings Volume 10585, 1058531 (2018) https://doi.org/10.1117/12.2302714
KEYWORDS: Critical dimension metrology, Photomasks, Semiconducting wafers, Metrology, Printing, Inspection, Scanning electron microscopy, Optical proximity correction, Optical lithography

Proceedings Article | 28 March 2016 Paper
Shimon Levi, Ishai Schwarzband, Roman Kris, Ofer Adan, Elly Shi, Ying Zhang, Kevin Zhou
Proceedings Volume 9782, 97820I (2016) https://doi.org/10.1117/12.2220814
KEYWORDS: Line edge roughness, Etching, Line width roughness, Scanning electron microscopy, Edge roughness, Optical lithography, Signal to noise ratio, Statistical analysis, Lithography, Stochastic processes

SPIE Journal Paper | 1 October 2014
Xiaoxiao Zhang, Hua Zhou, Zhenhua Ge, Alok Vaid, Deepasree Konduparthi, Carmen Osorio, Stefano Ventola, Roi Meir, Ori Shoval, Roman Kris, Ofer Adan, Maayan Bar-Zvi
JM3, Vol. 13, Issue 04, 041407, (October 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.041407
KEYWORDS: Metrology, Transmission electron microscopy, Semiconducting wafers, Scanning electron microscopy, Electron microscopes, Process control, 3D metrology, Diffractive optical elements, Oxides

Showing 5 of 19 publications
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