Dr. Volker A. Boegli
VP of Engineering at Carl Zeiss SMT GmbH
SPIE Involvement:
Publications (9)

Proceedings Article | 17 October 2008 Paper
Marcus Pritschow, Volker Boegli, Joerg Butschke, Mathias Irmscher, Douglas Resnick, Holger Sailer, Kosta Selinidis, Ecron Thompson
Proceedings Volume 7122, 71222L (2008) https://doi.org/10.1117/12.801946
KEYWORDS: Etching, Quartz, Photomasks, Nanoimprint lithography, Opacity, Inspection, Ultraviolet radiation, Scanning electron microscopy, Phase shifts, Silicon

Proceedings Article | 20 October 2006 Paper
Volker Boegli, Nicole Auth, Uli Hofmann
Proceedings Volume 6349, 63491G (2006) https://doi.org/10.1117/12.686404
KEYWORDS: Databases, Image processing, Critical dimension metrology, Magnesium, Image resolution, Standards development, Line edge roughness, Image acquisition, Data conversion, Etching

Proceedings Article | 28 June 2005 Paper
Klaus Edinger, Volker Boegli, Wolfgang Degel
Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617495
KEYWORDS: Photomasks, Binary data, Electron beams, Opacity, Chromium, Scanning electron microscopy, Etching, Magnesium, Quartz, Phase shifts

Proceedings Article | 16 June 2005 Paper
Proceedings Volume 5835, (2005) https://doi.org/10.1117/12.637273
KEYWORDS: Photomasks, Binary data, Electron beams, Opacity, Chromium, Quartz, Etching, Signal processing, Image processing, Magnesium

Proceedings Article | 20 August 2004 Paper
Ted Liang, Alan Stivers, Michael Penn, Dan Bald, Chetan Sethi, Volker Boegli, Michael Budach, Klaus Edinger, Petra Spies
Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557788
KEYWORDS: Photomasks, Etching, Electron beams, Extreme ultraviolet, Scanning electron microscopy, Ruthenium, Atomic force microscopy, Gases, Chromium, Spatial resolution

Showing 5 of 9 publications
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