Dr. Volker A. Boegli Profile

Dr. Volker A. Boegli

VP of Engineering at Carl Zeiss SMT GmbH

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Publications (9)

Proceedings Article | 17 October 2008 Paper

Evaluation of e-beam repair for nanoimprint templates

Marcus Pritschow, Volker Boegli, Joerg Butschke, Mathias Irmscher, Douglas Resnick, Holger Sailer, Kosta Selinidis, Ecron Thompson

Proceedings Volume 7122, 71222L (2008) https://doi.org/10.1117/12.801946

KEYWORDS: Etching, Quartz, Photomasks, Nanoimprint lithography, Opacity, Inspection, Ultraviolet radiation, Scanning electron microscopy, Phase shifts, Silicon

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Proceedings Article | 20 October 2006 Paper

Mask repair using layout-based pattern copy for the 65-nm node and beyond

Volker Boegli, Nicole Auth, Uli Hofmann

Proceedings Volume 6349, 63491G (2006) https://doi.org/10.1117/12.686404

KEYWORDS: Databases, Image processing, Critical dimension metrology, Magnesium, Image resolution, Standards development, Line edge roughness, Image acquisition, Data conversion, Etching

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Proceedings Article | 28 June 2005 Paper

Performance results from the Zeiss/NaWoTec MeRit MG electron beam mask repair tool

Klaus Edinger, Volker Boegli, Wolfgang Degel

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617495

KEYWORDS: Photomasks, Binary data, Electron beams, Opacity, Chromium, Scanning electron microscopy, Etching, Magnesium, Quartz, Phase shifts

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Proceedings Article | 16 June 2005 Paper

Application data of the electron beam based photomask repair tool MeRiT MG

Christian Ehrlich, Klaus Edinger, Volker Boegli, Peter Kuschnerus

Proceedings Volume 5835, (2005) https://doi.org/10.1117/12.637273

KEYWORDS: Photomasks, Binary data, Electron beams, Opacity, Chromium, Quartz, Etching, Signal processing, Image processing, Magnesium

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Proceedings Article | 20 August 2004 Paper

Demonstration of damage-free mask repair using electron beam-induced processes

Ted Liang, Alan Stivers, Michael Penn, Dan Bald, Chetan Sethi, Volker Boegli, Michael Budach, Klaus Edinger, Petra Spies

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557788

KEYWORDS: Photomasks, Etching, Electron beams, Extreme ultraviolet, Scanning electron microscopy, Ruthenium, Atomic force microscopy, Gases, Chromium, Spatial resolution

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Proceedings Article | 17 December 2003 Paper

A novel electron-beam-based photomask repair tool

Klaus Edinger, Hans Becht, Rainer Becker, Volker Bert, Volker Boegli, Michael Budach, Susanne Göhde, Jochen Guyot, Thorsten Hofmann, Ottmar Hoinkis, Alexander Kaya, Hans Koops, Petra Spies, Bernd Weyrauch, Johannes Bihr

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.532866

KEYWORDS: Photomasks, Etching, Electron beams, Quartz, Silicon carbide, Scanning electron microscopy, Image processing, Chromium, Ion beams, Molecules

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Proceedings Article | 28 August 2003 Paper

Application of electron-beam induced processes to mask repair

Klaus Edinger, Volker Boegli, Michael Budach, Ottmar Hoinkis, Bernd Weyrauch, Hans Koops, Johannes Bihr, Jens Greiser

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504061

KEYWORDS: Photomasks, Etching, Electron beams, Ion beams, Lithography, Silicon carbide, Gemini Observatory, Magnetism, Signal attenuation, Electron beam lithography

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Proceedings Article | 28 May 2003 Paper

Electron-beam mask repair with induced reactions

Hans Koops, Klaus Edinger, Johannes Bihr, Volker Boegli, Jens Greiser

Proceedings Volume 5148, (2003) https://doi.org/10.1117/12.514972

KEYWORDS: Photomasks, Electron beams, Etching, Platinum, Interferometers, Charged-particle lithography, Quartz, Silicon carbide, Scanning electron microscopy, Control systems

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Proceedings Article | 27 December 2002 Paper

Electron-beam-induced processes and their applicability to mask repair

Volker Boegli, Hans Koops, Michael Budach, Klaus Edinger, Ottmar Hoinkis, Bernd Weyrauch, Rainer Becker, Rudolf Schmidt, Alexander Kaya, Andreas Reinhardt, Stephan Braeuer, Heinz Honold, Johannes Bihr, Jens Greiser, Michael Eisenmann

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468200

KEYWORDS: Photomasks, Electron beams, Etching, Platinum, Ultraviolet radiation, Extreme ultraviolet, Quartz, Scanning electron microscopy, Interferometers, Chemical reactions

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Showing 5 of 9 publications

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