Dr. Ted Liang Profile

Dr. Ted Liang

Principal Engineer at Intel Corp

SPIE Involvement:

Conference Program Committee | Editor | Author

Publications (38)

Proceedings Article | 23 March 2021 Presentation + Paper

Laser-assisted discharge produced plasma (LDP) EUV source for actinic patterned mask inspection (APMI)

Safak Sayan, Kishore Chakravorty, Yusuke Teramoto, Takahiro Shirai, Shunichi Morimoto, Hidenori Watanabe, Yoshihiko Sato, Kazuya Aoki, Ted Liang, Yoshihiro Tezuka, Marieke Jager, Firoz Ghadiali, Frank Abboud, Steven Carson

Proceedings Volume 11609, 116090L (2021) https://doi.org/10.1117/12.2588788

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Proceedings Article | 23 March 2020 Paper

EUV mask infrastructure and actinic pattern mask inspection

Ted Liang, Yoshihiro Tezuka, Marieke Jager, Kishore Chakravorty, Safak Sayan, Eric Frendberg, Srinath Satyanarayana, Firoz Ghadiali, Guojing Zhang, Frank Abboud

Proceedings Volume 11323, 1132310 (2020) https://doi.org/10.1117/12.2554496

KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Pellicles, Extreme ultraviolet lithography, Defect detection, Optical inspection, Semiconducting wafers, Deep ultraviolet, EUV optics

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SPIE Journal Paper | 27 December 2017 Open Access

Special Section Guest Editorial: EUV Lithography for the 3-nm Node and Beyond

Vivek Bakshi, Hakaru Mizoguchi, Ted Liang, Andrew Grenville, Jos Benschop

JM3, Vol. 16, Issue 04, 041001, (December 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.4.041001

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Optical lithography, Pellicles, Inspection, Optical proximity correction, Free electron lasers, Printing, Scanners

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Proceedings Article | 18 March 2016 Open Access

EUV progress toward HVM readiness

Britt Turkot, Steven Carson, Anna Lio, Ted Liang, Mark Phillips, Brian McCool, Eric Stenehjem, Tim Crimmins, Guojing Zhang, Sam Sivakumar

Proceedings Volume 9776, 977602 (2016) https://doi.org/10.1117/12.2225014

KEYWORDS: Extreme ultraviolet, Reticles, Pellicles, Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Scanners, Optical lithography, Inspection, Yield improvement

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Proceedings Article | 11 November 2015 Paper

EUV mask infrastructure readiness and gaps for TD and HVM

Ted Liang, John Magana, Kishore Chakravorty, Eric Panning, Guojing Zhang

Proceedings Volume 9635, 963509 (2015) https://doi.org/10.1117/12.2202724

KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Pellicles, Extreme ultraviolet lithography, Particles, Scanners, Semiconducting wafers, Deep ultraviolet, Defect inspection

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Proceedings Article | 16 March 2015 Paper

Enhancing defect detection with Zernike phase contrast in EUV multilayer blank inspection

Yow-Gwo Wang, Ryan Miyakawa, Weilun Chao, Markus Benk, Antoine Wojdyla, Alex Donoghue, David Johnson, Kenneth Goldberg, Andy Neureuther, Ted Liang, Patrick Naulleau

Proceedings Volume 9422, 94221C (2015) https://doi.org/10.1117/12.2087532

KEYWORDS: Signal to noise ratio, Phase contrast, Phase shifts, Apodization, Extreme ultraviolet, Inspection, Microscopes, Interference (communication), Absorption, Defect detection

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Proceedings Article | 17 April 2014 Paper

Evaluation of mask repair strategies via focused electron, helium, and neon beam induced processing for EUV applications

C. Gonzalez, W. Slingenbergh, R. Timilsina, J.-H. Noh, M. Stanford, B. Lewis, K. Klein, T. Liang, J. Fowlkes, P. Rack

Proceedings Volume 9048, 90480M (2014) https://doi.org/10.1117/12.2046712

KEYWORDS: Nickel, Helium, Neon, Ruthenium, Ions, Etching, Electron beams, Extreme ultraviolet, Transmission electron microscopy, Monte Carlo methods

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Proceedings Article | 20 March 2010 Paper

Techniques for removal of contamination from EUVL mask without surface damage

Sherjang Singh, Ssuwei Chen, Tobias Wähler, Rik Jonckheere, Ted Liang, Robert Chen, Uwe Dietze

Proceedings Volume 7636, 76360Y (2010) https://doi.org/10.1117/12.847026

KEYWORDS: Reflectivity, Ultraviolet radiation, Extreme ultraviolet, Ruthenium, Photomasks, Surface roughness, Extreme ultraviolet lithography, Carbon, Particles, Contamination

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Proceedings Article | 20 March 2010 Paper

Printability of extreme ultraviolet lithography mask pattern defects for 22-40 nm half-pitch features

Grant Kloster, Ted Liang, Todd Younkin, Ernisse Putna, Roman Caudillo, Il-Seok Son

Proceedings Volume 7636, 76360M (2010) https://doi.org/10.1117/12.845740

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Extreme ultraviolet, Scanning electron microscopy, Line width roughness, Optical lithography, Photoresist materials, Lithography, Metrology

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Proceedings Article | 23 September 2009 Paper

Investigation of buried EUV mask defect printability using actinic inspection and fast simulation

Chris Clifford, Tina Chan, Andrew Neureuther, Kenneth Goldberg, Iacopo Mochi, Ted Liang

Proceedings Volume 7488, 74882H (2009) https://doi.org/10.1117/12.829716

KEYWORDS: Photomasks, Critical dimension metrology, Extreme ultraviolet, Inspection, Defect detection, Extreme ultraviolet lithography, High volume manufacturing, Semiconducting wafers, Multilayers, Computer simulations

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Proceedings Article | 23 September 2009 Paper

50nm particle removal from EUV mask blank using standard wet clean

Takeya Shimomura, Ted Liang

Proceedings Volume 7488, 74882F (2009) https://doi.org/10.1117/12.831272

KEYWORDS: Particles, Silicon, Extreme ultraviolet, Ruthenium, Photomasks, Scanning probe microscopy, Inspection, Mask cleaning, Scanning electron microscopy, Atomic force microscopy

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Proceedings Article | 11 May 2009 Paper

Improvement of EUVL mask blank inspection capability at Intel

Andy Ma, Ted Liang, Seh-Jin Park, Guojing Zhang, Tomoya Tamura, Kazunori Omata, Yuta Sato, Hal Kusunose

Proceedings Volume 7379, 73790I (2009) https://doi.org/10.1117/12.824259

KEYWORDS: Inspection, Quartz, Silica, Photomasks, Particles, Extreme ultraviolet lithography, Extreme ultraviolet, Defect detection, Surface roughness, Defect inspection

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Proceedings Article | 18 March 2009 Paper

Demonstration of full-field patterning of 32 nm test chips using EUVL

Gilroy Vandentop, Manish Chandhok, Ernisse Putna, Todd Younkin, James Clarke, Steven Carson, Alan Myers, Michael Leeson, Guojing Zhang, Ted Liang, Tetsunori Murachi

Proceedings Volume 7271, 727116 (2009) https://doi.org/10.1117/12.814436

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Inspection, Optical lithography, Extreme ultraviolet, Particles, Photoresist materials, Line width roughness, Reticles, Semiconducting wafers

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Proceedings Article | 18 March 2009 Paper

Comparison of fast 3D simulation and actinic inspection for EUV masks with buried defects

Chris Clifford, Sandy Wiraatmadja, Tina Chan, Andrew Neureuther, Kenneth Goldberg, Iacopo Mochi, Ted Liang

Proceedings Volume 7271, 72711F (2009) https://doi.org/10.1117/12.813846

KEYWORDS: Monochromatic aberrations, Extreme ultraviolet, Inspection, Photomasks, Spherical lenses, Extreme ultraviolet lithography, Near field, Computer simulations, Lithography, Image analysis

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Proceedings Article | 17 October 2008 Paper

Chemical durability studies of Ru-capped EUV mask blanks

Takeya Shimomura, Ted Liang

Proceedings Volume 7122, 712226 (2008) https://doi.org/10.1117/12.803065

KEYWORDS: Ruthenium, Extreme ultraviolet, Scanning probe microscopy, Reflectivity, Atomic force microscopy, Photomasks, Silicon, Chemistry, Multilayers, Extreme ultraviolet lithography

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Proceedings Article | 22 March 2008 Paper

Controlled deposition of NIST-traceable nanoparticles as additional size standards for photomask applications

Jing Wang, David Pui, Chaolong Qi, Se-Jin Yook, Heinz Fissan, Erdem Ultanir, Ted Liang

Proceedings Volume 6922, 69220G (2008) https://doi.org/10.1117/12.756741

KEYWORDS: Particles, Silica, Atmospheric particles, Inspection, Quartz, Gold, Calibration, Standards development, Aerosols, Photomasks

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Proceedings Article | 30 October 2007 Paper

Investigation of resist effects on EUV mask defect printability

Zhiyu Zhang, Ted Liang

Proceedings Volume 6730, 673016 (2007) https://doi.org/10.1117/12.746707

KEYWORDS: Data modeling, Photomasks, Printing, Photoresist processing, Nanoimprint lithography, Extreme ultraviolet lithography, Image quality, Optical lithography, Image enhancement, Semiconducting wafers

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Proceedings Article | 29 May 2007 Paper

Progress on EUV mask fabrication for 32-nm technology node and beyond

Guojing Zhang, Pei-Yang Yan, Ted Liang, Seh-jin Park, Peter Sanchez, Emily Shu, Erdem Ultanir, Sven Henrichs, Alan Stivers, Gilroy Vandentop, Barry Lieberman, Ping Qu

Proceedings Volume 6607, 66070R (2007) https://doi.org/10.1117/12.728941

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Inspection, Extreme ultraviolet, Multilayers, Reflectivity, Etching, Mask making, Metrology, Defect inspection

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Proceedings Article | 20 May 2006 Paper

EUV mask pattern defect printability

Ted Liang, Guojing Zhang, Patrick Naulleau, Alan Myers, Seh-Jin Park, Alan Stivers, Gilroy Vandentop

Proceedings Volume 6283, 62830K (2006) https://doi.org/10.1117/12.681844

KEYWORDS: Photomasks, Extreme ultraviolet, Inspection, Extreme ultraviolet lithography, Scanning electron microscopy, Printing, Cadmium, Photomicroscopy, Semiconducting wafers, Optical lithography

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Proceedings Article | 20 May 2006 Paper

EUV mask process development and integration

Guojing Zhang, Pei-Yang Yan, Ted Liang, Yan Du, Peter Sanchez, Seh-jin Park, Eric Lanzendorf, Chang Ju Choi, Emily Shu, Alan Stivers, Jeff Farnsworth, Kangmin Hsia, Manish Chandhok, Michael Leeson, Gilroy Vandentop

Proceedings Volume 6283, 62830G (2006) https://doi.org/10.1117/12.681839

KEYWORDS: Photomasks, Extreme ultraviolet, Etching, Reflectivity, Defect inspection, Extreme ultraviolet lithography, Inspection, Ruthenium, Image processing, Optical lithography

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Proceedings Article | 10 May 2005 Paper

Understanding and reduction of defects on finished EUV masks

Ted Liang, Peter Sanchez, Guojing Zhang, Emily Shu, Rajesh Nagpal, Alan Stivers

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.604717

KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Deep ultraviolet, Scanning electron microscopy, Atomic force microscopy, Contamination, Defect inspection, Extreme ultraviolet lithography, EUV optics

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Proceedings Article | 6 December 2004 Paper

E-beam mask repair: fundamental capability and applications

Ted Liang, Eric Frendberg, Daniel Bald, Michael Penn, Alan Stivers

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569210

KEYWORDS: Etching, Quartz, Photomasks, Extreme ultraviolet, Chromium, Scanning electron microscopy, Electron beams, Scanning probe microscopy, Ruthenium, Atomic force microscopy

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Proceedings Article | 6 December 2004 Paper

EUV mask pilot line at Intel Corporation

Alan Stivers, Pei-Yang Yan, Guojing Zhang, Ted Liang, Emily Shu, Edita Tejnil, Barry Lieberman, Rajesh Nagpal, Kangmin Hsia, Michael Penn, Fu-Chang Lo

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569176

KEYWORDS: Photomasks, Extreme ultraviolet, Inspection, Extreme ultraviolet lithography, Reflectivity, Metrology, Lithography, Optical lithography, Standards development, Mask making

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Proceedings Article | 20 August 2004 Paper

Demonstration of damage-free mask repair using electron beam-induced processes

Ted Liang, Alan Stivers, Michael Penn, Dan Bald, Chetan Sethi, Volker Boegli, Michael Budach, Klaus Edinger, Petra Spies

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557788

KEYWORDS: Photomasks, Etching, Electron beams, Extreme ultraviolet, Scanning electron microscopy, Ruthenium, Atomic force microscopy, Gases, Chromium, Spatial resolution

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Proceedings Article | 20 May 2004 Paper

EUVL defect printability at the 32-nm node

Eric Gullikson, Edita Tejnil, Ted Liang, Alan Stivers

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.558816

KEYWORDS: Multilayers, Extreme ultraviolet lithography, Photomasks, Coating, Reflectivity, Opacity, Cameras, Semiconducting wafers, Systems modeling, Scattering

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Proceedings Article | 17 December 2003 Paper

EUV substrate and blank inspection with confocal microscopy

Jan-Peter Urbach, Jan Cavelaars, Hal Kusunose, Ted Liang, Alan Stivers

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518388

KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Quartz, Confocal microscopy, Scattering, Particles, Signal detection, Extreme ultraviolet

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Proceedings Article | 27 December 2002 Paper

Pattern inspection of EUV masks using DUV light

Ted Liang, Edita Tejnil, Alan Stivers

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467298

KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Deep ultraviolet, Oxides, Etching, Extreme ultraviolet lithography, Reflectivity, Contamination, Defect inspection

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Proceedings Article | 27 December 2002 Paper

Evaluation of the capability of a multibeam confocal inspection system for inspection of EUVL mask blanks

Alan Stivers, Ted Liang, Michael Penn, Barry Lieberman, Gilbert Shelden, James Folta, Cindy Larson, Paul Mirkarimi, Christopher Walton, Eric Gulliksong, Moonsuk Yi

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468199

KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Defect detection, Particles, Gold, Extreme ultraviolet lithography, Semiconducting wafers, Optical spheres, Multilayers

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Proceedings Article | 1 August 2002 Paper

Use of nanomachining for subtractive repair of EUV and other challenging mask defects

David Brinkley, Roy White, Ron Bozak, Ted Liang, Gang Liu

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476998

KEYWORDS: Photomasks, Extreme ultraviolet, Carbon, Contamination, Atomic force microscopy, Image processing, Quartz, Etching, Reflectivity, Phase shifts

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Proceedings Article | 1 July 2002 Paper

Damage-free mask repair using electron-beam-induced chemical reactions

Ted Liang, Alan Stivers

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472312

KEYWORDS: Etching, Ions, Photomasks, Gallium, Extreme ultraviolet, Electron beams, Quartz, Atomic force microscopy, Chromium, Platinum

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Proceedings Article | 1 July 2002 Paper

Inspection of EUV reticles

Donald Pettibone, Andrei Veldman, Ted Liang, Alan Stivers, Pawitter Mangat, Bing Lu, Scott Hector, James Wasson, Kenneth Blaedel, Emily Fisch, David Walker

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472311

KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Reflectivity, Silicon, Deep ultraviolet, Reticles, Semiconducting wafers, Multilayers, Glasses

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Proceedings Article | 11 March 2002 Paper

Enhanced optical inspectability of patterned EUVL mask

Ted Liang, Alan Stivers, Pei-yang Yan, Edita Tejnil, Guojing Zhang

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458303

KEYWORDS: Inspection, Reflectivity, Extreme ultraviolet lithography, Photomasks, Deep ultraviolet, Chromium, Image transmission, Optical inspection, Image enhancement, Ruthenium

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Proceedings Article | 20 August 2001 Paper

TaN EUVL mask fabrication and characterization

Pei-yang Yan, Guojing Zhang, Andy Ma, Ted Liang

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436668

KEYWORDS: Photomasks, Etching, Extreme ultraviolet, Metals, Reflectivity, Extreme ultraviolet lithography, Optical lithography, Chromium, Tin, Oxides

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Proceedings Article | 22 January 2001 Paper

UV inspection of EUV and SCALPEL reticles

Donald Pettibone, Noah Bareket, Ted Liang, Alan Stivers, Scott Hector, Pawitter Mangat, Douglas Resnick, Michael Lercel, Mark Lawliss, Christopher Magg, Anthony Novembre, Reginald Farrow

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410699

KEYWORDS: Photomasks, Inspection, Charged-particle lithography, Extreme ultraviolet, Reticles, Reflectivity, Semiconducting wafers, Silicon, Ultraviolet radiation, Chromium

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Proceedings Article | 22 January 2001 Paper

Cr absorber mask for extreme-ultraviolet lithography

Guojing Zhang, Pei-yang Yan, Ted Liang

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410675

KEYWORDS: Chromium, Photomasks, Etching, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Multilayers, Inspection, Silicon, Semiconducting wafers

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Proceedings Article | 19 July 2000 Paper

EUV mask absorber characterization and selection

Pei-yang Yan, Guojing Zhang, Patrick Kofron, Jeffrey Powers, Mark Tran, Ted Liang, Alan Stivers, Fu-Chang Lo

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392025

KEYWORDS: Etching, Metals, Photomasks, Oxides, Inspection, Extreme ultraviolet lithography, Extreme ultraviolet, Reflectivity, Tantalum, Chromium

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Proceedings Article | 30 December 1999 Paper

Use of programmed multilayer defects in validating a defect compensation strategy for EUV lithography

Avijit Ray-Chaudhuri, Gregory Cardinale, Aaron Fisher, Pawitter Mangat, Ted Liang, Donald Sweeney

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373378

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Multilayers, Photomasks, Optical proximity correction, Line edge roughness, Coating, Mask making, Scanning electron microscopy, Imaging systems

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Proceedings Article | 27 May 1996 Paper

Novel x-ray mask inspection tool based on transmission x-ray conversion microscope

Ted Liang, Franco Cerrina, Thomas Lucatorto

Proceedings Volume 2723, (1996) https://doi.org/10.1117/12.240473

KEYWORDS: X-rays, Photomasks, Inspection, X-ray lithography, Microscopes, Spatial resolution, Objectives, Carbon, X-ray imaging, Transmission electron microscopy

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Showing 5 of 38 publications

Proceedings Volume Editor (2)

SPIE Conference Volume | 4 December 2023

Photomask Technology 2023

SPIE Conference Volume | 9 December 2022

Photomask Technology 2022

Conference Committee Involvement (24)

Photomask Technology 2024

29 September 2024 | Monterey, California, United States

International Conference on Extreme Ultraviolet Lithography 2024

29 September 2024 | Monterey, California, United States

Optical and EUV Nanolithography XXXVII

26 February 2024 | San Jose, California, United States

International Conference on Extreme Ultraviolet Lithography 2023

2 October 2023 | Monterey, California, United States

Photomask Technology 2023

2 October 2023 | Monterey, California, United States

Optical and EUV Nanolithography XXXVI

27 February 2023 | San Jose, California, United States

Photomask Technology 2022

26 September 2022 | Monterey, California, United States

International Conference on Extreme Ultraviolet Lithography 2022

26 September 2022 | Monterey, California, United States

Optical and EUV Nanolithography XXXV

25 April 2022 | San Jose, California, United States

International Conference on Extreme Ultraviolet Lithography 2021

27 September 2021 | Online Only, United States

Extreme Ultraviolet (EUV) Lithography XII

22 February 2021 | Online Only, California, United States

International Conference on Extreme Ultraviolet Lithography 2020

21 September 2020 | Online Only, California, United States

Extreme Ultraviolet (EUV) Lithography XI

24 February 2020 | San Jose, California, United States

International Conference on Extreme Ultraviolet Lithography 2019

16 September 2019 | Monterey, California, United States

Extreme Ultraviolet (EUV) Lithography X

25 February 2019 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography IX

26 February 2018 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography VIII

27 February 2017 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography VII

22 February 2016 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography VI

23 February 2015 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography V

24 February 2014 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography IV

25 February 2013 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography III

13 February 2012 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography II

28 February 2011 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography

22 February 2010 | San Jose, California, United States

Showing 5 of 24 Conference Committees

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