Dr. Emad Aqad
SPIE Involvement:
Author
Publications (12)

Proceedings Article | 10 April 2024 Presentation + Paper
ChoongBong Lee, Yinjie Cen, Jong Keun Park, Emad Aqad, Benjamin Naab-Rafael, Suzanne Coley, Li Cui, Stefan Alexandrescu, Rochelle Rena, Sylvie Eckert, Jason Behnke, Karen Petrillo
Proceedings Volume 12957, 129570A (2024) https://doi.org/10.1117/12.3010931
KEYWORDS: Etching, Photoresist materials, Extreme ultraviolet lithography

Proceedings Article | 9 April 2024 Paper
J. Lachowski, M. Hayes, S. Wong, J. Li, A. Kwok, W. Huang, J. Park, Q. Xie, K. Petrillo, E. Aqad, M. Li, C. Hoelzel, K. Hernandez, E. Vitaku, H. He, H. Mackay, J. Cameron, C. Xu, T. Marangoni, C. Liu, P. LaBeaume
Proceedings Volume 12957, 129572B (2024) https://doi.org/10.1117/12.3025297
KEYWORDS: Photoacid generators, Photoresist materials, Semiconducting wafers, Design, Lithography, Optical lithography, Coating thickness, Chemistry, Coating, Silicon, Sustainability, Extreme ultraviolet lithography

Proceedings Article | 9 April 2024 Paper
Chunyi Wu, Mike Finch, Yinjie Cen, ChoongBong Lee, Emad Aqad, Li Cui, Suzanne Coley, Jong Keun Park, Benjamin Naab-Rafael, Rochelle Rena, Tyler Paul, Sylvie Eckert, Jason Behnke, Karen Petrillo
Proceedings Volume 12957, 129571Z (2024) https://doi.org/10.1117/12.3010961
KEYWORDS: Polymers, Extreme ultraviolet, Absorption, Extreme ultraviolet lithography, Photoresist materials, Line width roughness, Lithography

Proceedings Article | 9 April 2024 Paper
Jong Keun Park, Emad Aqad, Yinjie Cen, Suzanne Coley, Li Cui, Conner Hoelzel, Jason Behnke, Rochelle Rena, Sylvie Eckert, Stefan Alexandrescu, K. A. Niradha Sachinthani, Michael Finch, Karen Petrillo, Benjamin Rafael-Naab, Choong Bong Lee, Li Cheng
Proceedings Volume 12957, 129571S (2024) https://doi.org/10.1117/12.3010493
KEYWORDS: Defect inspection, Photoresist materials, Polymers, Line width roughness, Extreme ultraviolet lithography, Photoacid generators, Semiconducting wafers

Proceedings Article | 1 May 2023 Presentation + Paper
Choongbong Lee, Emad Aqad, Conner Hoelzel, Yinjie Cen, Li Cui, Suzanne Coley, Benjamin Naab, Rochelle Rena, Philjae Kang, You Rim Shin, David Limberg, Lei Zhang, Jong Keun Park
Proceedings Volume 12499, 124990I (2023) https://doi.org/10.1117/12.2659178
KEYWORDS: Etching, Iodine, Extreme ultraviolet, Plasma, Plasma etching, X-ray photoelectron spectroscopy, Photoresist materials, Extreme ultraviolet lithography, Light absorption, Absorption

Showing 5 of 12 publications
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