Dr. Li Cui
at DuPont Electronics & Industrial
SPIE Involvement:
Publications (7)

Proceedings Article | 1 May 2023 Presentation + Paper
Jong Keun Park, Emad Aqad, Yinjie Cen, Suzanne Coley, Li Cui, Conner Hoelzel, Benjamin Naab, Choongbong Lee, Rochelle Rena, Philjae Kang, You Rim Shin, David Limberg, Lei Zhang
Proceedings Volume 12499, 124990I (2023) https://doi.org/10.1117/12.2659178
KEYWORDS: Etching, Iodine, Extreme ultraviolet, Plasma, Plasma etching, X-ray photoelectron spectroscopy, Photoresist materials, Extreme ultraviolet lithography, Light absorption, Absorption

Proceedings Article | 1 May 2023 Poster + Paper
Yinjie Cen, ChoongBong Lee, Li Cui, Suzanne Coley, Jong Keun Park, Benjamin Naab-Rafael, Emad Aqad, Rochelle Rena, Tyler Paul, Tom Penniman, Jason Behnke, Julia Early, Benjamin Foltz
Proceedings Volume 12498, 124981W (2023) https://doi.org/10.1117/12.2659101
KEYWORDS: Photoresist materials, Film thickness, Lithography, Extreme ultraviolet lithography, Line width roughness, Thin films, Surface roughness

Proceedings Article | 1 May 2023 Poster + Paper
Conner Hoelzel, Li Cui, Benjamin Naab, Jong Park, Philjae Kang, Kenneth Hernandez, Suzanne Coley, Stefan Alexandrescu, Rochelle Rena, James Cameron, Emad Aqad
Proceedings Volume 12498, 124981V (2023) https://doi.org/10.1117/12.2658981
KEYWORDS: Photoacid generators, Extreme ultraviolet lithography, Electrons, Extreme ultraviolet, Polymers, Design and modelling, Lithography, Materials properties, Line width roughness, Semiconducting wafers

Proceedings Article | 22 February 2021 Presentation + Paper
Proceedings Volume 11612, 116120F (2021) https://doi.org/10.1117/12.2583630
KEYWORDS: Etching, Absorbance, Carbon, Resistance, System on a chip, Reactive ion etching, Polymers, Image processing, Photoresist materials, Optical lithography

Proceedings Article | 22 February 2021 Presentation + Paper
Emad Aqad, ChoongBong Lee, Suzanne Coley, Ke Yang, Li Cui, Manibarsha Goswami, Bhooshan Popere, Tomas Marangoni, James Cameron, James Thackeray
Proceedings Volume 11609, 116090I (2021) https://doi.org/10.1117/12.2583642
KEYWORDS: Extreme ultraviolet, Polymers, Absorption, Quantum efficiency, Imaging systems, Yield improvement, Systems modeling, Stochastic processes, Modulation, Lithography

Showing 5 of 7 publications
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