Dr. Georg Erley
at Qoniac GmbH
SPIE Involvement:
Publications (7)

SPIE Journal Paper | 12 November 2019
JM3, Vol. 18, Issue 04, 043505, (November 2019) https://doi.org/10.1117/12.10.1117/1.JMM.18.4.043505
KEYWORDS: Semiconducting wafers, Forward error correction, Sensors, Scanners, Optimization (mathematics), Control systems, Contamination, Optical lithography, Chemical mechanical planarization, Databases

Proceedings Article | 26 March 2019 Paper
Proceedings Volume 10959, 109591P (2019) https://doi.org/10.1117/12.2514978
KEYWORDS: Semiconducting wafers, Sensors, Scanners, Optimization (mathematics), Contamination, Data acquisition, Optical lithography

Proceedings Article | 13 March 2018 Paper
Proceedings Volume 10585, 105851R (2018) https://doi.org/10.1117/12.2297358
KEYWORDS: Optical alignment, Semiconducting wafers, Reticles, Overlay metrology, Data modeling, Neodymium, HVAC controls, Distortion, Calibration, Roads

Proceedings Article | 13 March 2018 Presentation + Paper
Marshall Overcast, Corey Mellegaard, David Daniel, Boris Habets, Georg Erley, Steffen Guhlemann, Xaver Thrun, Stefan Buhl, Steven Tottewitz
Proceedings Volume 10585, 105851U (2018) https://doi.org/10.1117/12.2303487
KEYWORDS: Semiconducting wafers, Overlay metrology, Etching, Machine learning, Optical alignment, Error analysis, Metrology, Lithography, Data processing, Semiconductors

Proceedings Article | 8 March 2016 Paper
MinGyu Kim, Jaewuk Ju, Boris Habets, Georg Erley, Enrico Bellmann, Seop Kim
Proceedings Volume 9778, 97783O (2016) https://doi.org/10.1117/12.2230389
KEYWORDS: Semiconducting wafers, Metals, Overlay metrology, Reflectivity, Scanners, High volume manufacturing, Environmental monitoring, Data processing, Databases, Contamination

Showing 5 of 7 publications
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