Dr. Rasmus B. Nielsen
at ASML Netherlands BV
SPIE Involvement:
Publications (11)

Proceedings Article | 10 April 2024 Presentation
Will Conley, Stephen Hsu, Michael Crouse, Dylan Martin, Rajasekhar Rao, Natalllia Karlitskaya, Dirk van Leuken, Jan Baselmans, Marieke van Veen, Edwin de Jong, Birgitt Hepp, Rasmus Nielsen, Eric Bakker
Proceedings Volume PC12953, PC129530D (2024) https://doi.org/10.1117/12.3010892
KEYWORDS: Speckle, Pulsed laser operation, Line width roughness, Semiconducting wafers, Laser scanners, Simulations, Red lasers, Modulation, Edge roughness, Data processing

Proceedings Article | 13 June 2022 Presentation
Proceedings Volume PC12051, PC120510B (2022) https://doi.org/10.1117/12.2615263
KEYWORDS: Imaging systems, Process control, Photoresist materials, Lithography, 3D image processing, Semiconducting wafers, Scanners, Overlay metrology, Optical lithography, Image processing

Proceedings Article | 26 May 2022 Presentation + Paper
Guillaume Mernier, Danielle Palmen, Nicole Schoumans, Marieke van Veen, Rasmus Nielsen, Jan Baselmans
Proceedings Volume 12051, 1205104 (2022) https://doi.org/10.1117/12.2613333
KEYWORDS: Photomasks, Computer simulations, Reticles, Deep ultraviolet, Convolution

SPIE Journal Paper | 18 March 2013
JM3, Vol. 12, Issue 02, 021006, (March 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.2.021006
KEYWORDS: Photomasks, Reticles, Critical dimension metrology, Semiconducting wafers, Extreme ultraviolet lithography, Extreme ultraviolet, Cadmium, Reflectivity, Scanners, Semiconductors

Proceedings Article | 8 November 2012 Paper
Proceedings Volume 8522, 85220P (2012) https://doi.org/10.1117/12.970395
KEYWORDS: Photomasks, Reticles, Semiconducting wafers, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Scanners, Reflectivity, Cadmium, Semiconductors

Showing 5 of 11 publications
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