Dr. Peter Nikolsky
Principal Architect at ASML Netherlands BV
SPIE Involvement:
Author
Publications (18)

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Metrology, Lithographic illumination, Data modeling, Calibration, Image processing, Scanners, Laser scanners, Process control, Finite element methods, Photomasks, Computational lithography, 3D scanning, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 15, 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Reticles, Metrology, Scanners, Laser processing, Laser scanners, Photomasks, 3D scanning, Critical dimension metrology, Laser metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Semiconductors, Optical lithography, Etching, Manufacturing, Process control, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Yield improvement, Overlay metrology

PROCEEDINGS ARTICLE | October 1, 2013
Proc. SPIE. 8886, 29th European Mask and Lithography Conference
KEYWORDS: Reticles, Logic, Metals, Scanners, Double patterning technology, Critical dimension metrology, Semiconducting wafers, Tolerancing, Standards development

SPIE Journal Paper | March 18, 2013
JM3 Vol. 12 Issue 02
KEYWORDS: Photomasks, Reticles, Critical dimension metrology, Semiconducting wafers, Extreme ultraviolet lithography, Extreme ultraviolet, Cadmium, Reflectivity, Scanners, Semiconductors

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Semiconductors, Reticles, Cadmium, Scanners, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

Showing 5 of 18 publications
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