Dr. Seong-Ho Moon
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Publications (6)

Proceedings Article | 8 November 2012 Paper
Dmitry Vengertsev, Kihyun Kim, Seung-Hune Yang, Seongbo Shim, Seongho Moon, Artem Shamsuarov, Sooryong Lee, Seong-Woon Choi, Jungdal Choi, Ho-Kyu Kang
Proceedings Volume 8522, 85221A (2012) https://doi.org/10.1117/12.953827
KEYWORDS: Optical proximity correction, Calibration, Semiconducting wafers, Data modeling, Statistical modeling, Logic devices, Principal component analysis, Model-based design, Lithography, Optics manufacturing

Proceedings Article | 3 April 2012 Paper
Seung-Hune Yang, Eun Sung Kim, Seongho Moon, Sooryong Lee, Seong-Woon Choi, Jungdal Choi
Proceedings Volume 8325, 832504 (2012) https://doi.org/10.1117/12.915931
KEYWORDS: Photomasks, Binary data, Critical dimension metrology, Image quality, 3D acquisition, Image processing, Mathematical modeling, Image enhancement, Semiconducting wafers, 3D image processing

Proceedings Article | 13 March 2012 Paper
Bernd Küchler, Artem Shamsuarov, Thomas Mülders, Ulrich Klostermann, Seung-Hune Yang, Seongho Moon, Vitaliy Domnenko, Sung-Woon Park
Proceedings Volume 8326, 83260H (2012) https://doi.org/10.1117/12.916528
KEYWORDS: SRAF, Source mask optimization, Tolerancing, Array processing, Photomasks, Printing, Optimization (mathematics), Manufacturing, Lithography, Optical proximity correction

Proceedings Article | 5 April 2011 Paper
Proceedings Volume 7973, 79732I (2011) https://doi.org/10.1117/12.879577
KEYWORDS: Optical proximity correction, Lithography, Signal processing, Image quality, Nanoimprint lithography, Photomasks, Calibration, System on a chip, Data modeling, Computer simulations

Proceedings Article | 23 March 2011 Paper
Seongho Moon, Seunghune Yang, Artem Shamsuarov, Eunju Kim, Junghoon Ser, Youngchang Kim, Seongwoon Choi, Changjin Kang, Ulrich Klostermann, Bernd Küchler, John Lewellen, Thomas Schmöller, Sooryong Lee
Proceedings Volume 7973, 79730X (2011) https://doi.org/10.1117/12.879592
KEYWORDS: Calibration, Photomasks, Scanning electron microscopy, Cadmium, Metrology, Data modeling, Critical dimension metrology, 3D modeling, Optical proximity correction, Laser metrology

Showing 5 of 6 publications
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