Dr. Damien Perret
Research and Development Engineer at Rohm and Haas Electronic Materials SAS
SPIE Involvement:
Publications (6)

Proceedings Article | 15 May 2010 Paper
Raluca Tiron, Samir Derrough, Hervé Fontaine, Sylviane Cetre, Damien Perret, James Thackeray, Patrick Paniez
Proceedings Volume 7545, 75450G (2010) https://doi.org/10.1117/12.863150
KEYWORDS: Semiconducting wafers, Polymers, Diffusion, Ionization, Sensors, Molecules, Statistical analysis, Chromatography, Spectroscopy, Lithography

Proceedings Article | 26 March 2010 Paper
Samir Derrough, Raluca Tiron, Damien Perret, James Thackeray, Claire Sourd, Patrick Paniez
Proceedings Volume 7639, 763937 (2010) https://doi.org/10.1117/12.846087
KEYWORDS: Diffusion, Lithography, Temperature metrology, Chemically amplified resists, Photoresist processing, Glasses, Line edge roughness, Systems modeling, Thermal analysis, Complex systems

Proceedings Article | 1 April 2009 Paper
Stewart Robertson, Michael Reilly, Trey Graves, John Biafore, Mark Smith, Damien Perret, Vladimir Ivin, Sergey Potashov, Mikhail Silakov, Nikolay Elistratov
Proceedings Volume 7273, 727340 (2009) https://doi.org/10.1117/12.813557
KEYWORDS: Semiconducting wafers, Coating, Silicon, Photoresist materials, Lithography, Scanning electron microscopy, Etching, Optical lithography, Reflectivity, Natural surfaces

Proceedings Article | 15 April 2008 Paper
Arnaud Bazin, Erwine Pargon, Xavier Mellhaoui, Damien Perret, Bénédicte Mortini, Olivier Joubert
Proceedings Volume 6923, 692337 (2008) https://doi.org/10.1117/12.772573
KEYWORDS: Plasma treatment, Etching, Argon, Resistance, Photoresist materials, Plasma, Polymers, FT-IR spectroscopy, Photoresist processing, Ellipsometry

Proceedings Article | 22 March 2007 Paper
Damien Perret, Cecily Andes, Kap-Soo Cheon, Mani Sobhian, Charles Szmanda, George Barclay, Peter Trefonas
Proceedings Volume 6519, 651912 (2007) https://doi.org/10.1117/12.712242
KEYWORDS: Etching, Polymers, Photoresist materials, Resistance, Chemical species, Lithography, Error analysis, Photoresist developing, Data modeling, Statistical modeling

Showing 5 of 6 publications
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