Dr. Charles R. Szmanda
Patent Agent at patent-practicecom
SPIE Involvement:
Publications (16)

Proceedings Article | 1 April 2009 Paper
Thomas Wallow, Junyan Dai, Charles Szmanda, Hiram Cervera, Chi Truong, Nikolaos Bekiaris, Jong-Wook Kye, Ryoung-Han Kim, Harry Levinson, Glen Mori
Proceedings Volume 7273, 72730D (2009) https://doi.org/10.1117/12.814468
KEYWORDS: Photoresist processing, Semiconducting wafers, Double patterning technology, Ultraviolet radiation, Photoresist materials, Image processing, Optical lithography, Lithography, Fourier transforms, Antireflective coatings

Proceedings Article | 1 April 2008 Paper
Proceedings Volume 6924, 692452 (2008) https://doi.org/10.1117/12.772741
KEYWORDS: Semiconducting wafers, Lithography, Refractive index, Double patterning technology, Photomasks, Computer simulations, Optical properties, Photoresist processing, Nonlinear optics, Superposition

Proceedings Article | 28 March 2008 Paper
Elsayed Hassanein, Craig Higgins, Patrick Naulleau, Richard Matyi, Gregg Gallatin, Gregory Denbeaux, Alin Antohe, Jim Thackeray, Kathleen Spear, Charles Szmanda, Christopher Anderson, Dimitra Niakoula, Matthew Malloy, Anwar Khurshid, Cecilia Montgomery, Emil Piscani, Andrew Rudack, Jeff Byers, Andy Ma, Kim Dean, Robert Brainard
Proceedings Volume 6921, 69211I (2008) https://doi.org/10.1117/12.774099
KEYWORDS: Quantum efficiency, Extreme ultraviolet lithography, Photoresist materials, Extreme ultraviolet, X-rays, Absorbance, Photons, Coating, Reflectometry, Line edge roughness

Proceedings Article | 22 March 2007 Paper
Damien Perret, Cecily Andes, Kap-Soo Cheon, Mani Sobhian, Charles Szmanda, George Barclay, Peter Trefonas
Proceedings Volume 6519, 651912 (2007) https://doi.org/10.1117/12.712242
KEYWORDS: Etching, Polymers, Photoresist materials, Resistance, Chemical species, Lithography, Error analysis, Photoresist developing, Data modeling, Statistical modeling

Proceedings Article | 24 July 2002 Paper
Gary Taylor, Cheng-Bai Xu, Gary Teng, JoAnne Leonard, Charles Szmanda, William Lawrence, Sassan Nur, Kirk Brown, Al Stephen
Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474261
KEYWORDS: Absorbance, Polymers, Lithography, Silicon, Etching, Absorption, Plasma etching, Resistance, Reflectivity, Optical lithography

Showing 5 of 16 publications
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