Dr. Ioannis Karageorgos
at imec
SPIE Involvement:
Publications (5)

Proceedings Article | 28 March 2017 Presentation + Paper
Daifeng Guo, Maryann Tung, Ioannis Karageorgos, H.-S. Philip Wong, Martin D. Wong
Proceedings Volume 10148, 101480E (2017) https://doi.org/10.1117/12.2257954
KEYWORDS: Directed self assembly, Algorithms, Electron beam lithography, Extreme ultraviolet lithography, Lithography, Mirrors, Semiconducting wafers, Polymers, Optical lithography, Manufacturing

SPIE Journal Paper | 7 November 2016
Ioannis Karageorgos, Julien Ryckaert, Roel Gronheid, Maryann Tung, H.-S. Philip Wong, Evangelos Karageorgos, Kris Croes, Joost Bekaert, Geert Vandenberghe, Michele Stucchi, Wim Dehaene
JM3, Vol. 15, Issue 04, 043506, (November 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.4.043506
KEYWORDS: Directed self assembly, Optical lithography, Metals, Photomasks, Lithography, Algorithm development, Immersion lithography, Molecular self-assembly, Electronic design automation, Extreme ultraviolet

Proceedings Article | 18 March 2016 Paper
Proceedings Volume 9776, 97761W (2016) https://doi.org/10.1117/12.2219876
KEYWORDS: Directed self assembly, Extreme ultraviolet, Optical lithography, Lithography, Extreme ultraviolet lithography, Logic, Scanners, Etching, Immersion lithography, Stochastic processes, Personal protective equipment, Photomasks, Scanning electron microscopy, Metrology

Proceedings Article | 16 March 2016 Paper
Ioannis Karageorgos, Julien Ryckaert, Maryann Tung, H.-S. Wong, Roel Gronheid, Joost Bekaert, Evangelos Karageorgos, Kris Croes, Geert Vandenberghe, Michele Stucchi, Wim Dehaene
Proceedings Volume 9781, 97810N (2016) https://doi.org/10.1117/12.2222041
KEYWORDS: Directed self assembly, Optical lithography, Computer aided design, Photomasks, Extreme ultraviolet, Lithography, Design for manufacturability, Manufacturing, Immersion lithography, Double patterning technology, Algorithm development, Polymethylmethacrylate

Proceedings Article | 19 March 2015 Paper
Proceedings Volume 9423, 942305 (2015) https://doi.org/10.1117/12.2086090
KEYWORDS: Optical lithography, Photomasks, Etching, Polymethylmethacrylate, Lithography, Double patterning technology, Scanning electron microscopy, Picosecond phenomena, Metals, Directed self assembly

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