Dr. Guanyang Lin
R&D Director at EMD Performance Materials Corp
SPIE Involvement:
Author
Publications (28)

SPIE Journal Paper | August 17, 2016
JM3 Vol. 15 Issue 03
KEYWORDS: Directed self assembly, Polymethylmethacrylate, Atomic force microscopy, Critical dimension metrology, System on a chip, Optical lithography, Semiconducting wafers, Etching, Silicon, Photomasks

PROCEEDINGS ARTICLE | March 25, 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Optical lithography, Etching, Polymers, Annealing, Silicon, Scanning electron microscopy, Directed self assembly, Line edge roughness, Photomicroscopy, Semiconducting wafers

PROCEEDINGS ARTICLE | March 25, 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Lithography, Optical lithography, Polymethylmethacrylate, Etching, Materials processing, Atomic force microscopy, Directed self assembly, Critical dimension metrology, Semiconducting wafers, System on a chip, Photoresist developing

PROCEEDINGS ARTICLE | March 22, 2016
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Lithography, Metrology, Optical lithography, Etching, Polymers, Silicon, Manufacturing, Scanning electron microscopy, Bridges, Directed self assembly, Epitaxy, Thin film coatings, Semiconducting wafers

SPIE Journal Paper | July 2, 2015
JM3 Vol. 14 Issue 03
KEYWORDS: Etching, Scanning electron microscopy, Silicon, Inspection, Semiconducting wafers, Diffractive optical elements, Defect inspection, Thin film coatings, Directed self assembly

PROCEEDINGS ARTICLE | March 20, 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Thin films, Lithography, Polymethylmethacrylate, Etching, Chemistry, Directed self assembly, Plasma etching, Line edge roughness, Semiconducting wafers, Tolerancing

Showing 5 of 28 publications
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