Dr. Joost Bekaert
at IMEC
SPIE Involvement:
Author
Publications (52)

SPIE Journal Paper | June 14, 2017
JM3 Vol. 16 Issue 02
KEYWORDS: Directed self assembly, Optical lithography, Immersion lithography, Photomasks, Integrated circuits, Lithography, Logic, Semiconducting wafers, Optical design, Optical proximity correction

PROCEEDINGS ARTICLE | April 26, 2017
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Logic, Optical lithography, Etching, Metals, Photomasks, Extreme ultraviolet, Semiconductor manufacturing, Computational lithography, Optical proximity correction, SRAF

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Oxides, Metrology, Data modeling, Calibration, Etching, Metals, Resistance, Photoresist materials, Finite element methods, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Semiconducting wafers, Back end of line

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Logic, Optical lithography, Etching, Metals, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Tin, Back end of line

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Logic, Optical lithography, Etching, Metals, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Double patterning technology, Critical dimension metrology, Semiconducting wafers, Stochastic processes, System on a chip, Back end of line

PROCEEDINGS ARTICLE | March 21, 2017
Proc. SPIE. 10149, Advanced Etch Technology for Nanopatterning VI
KEYWORDS: Source mask optimization, Photoresist processing, Semiconducting wafers, Overlay metrology

Showing 5 of 52 publications
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