Mr. Jerome Todeschini
at NXP Semiconductors
SPIE Involvement:
Author
Publications (6)

SPIE Journal Paper | July 1, 2007
JM3 Vol. 6 Issue 03
KEYWORDS: Modulation, Critical dimension metrology, Electron beam direct write lithography, Point spread functions, Electron beam lithography, Cadmium sulfide, Electron beams, Optical lithography, Manufacturing, Backscatter

PROCEEDINGS ARTICLE | May 6, 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Lithography, Optical lithography, Manufacturing, Photomasks, Optical proximity correction, Electron beam direct write lithography, Photoresist processing, Semiconducting wafers, Optics manufacturing, Standards development

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Semiconductors, Electron beam lithography, Electron beams, Etching, Coating, Manufacturing, Line width roughness, Electron beam direct write lithography, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | May 20, 2004
Proc. SPIE. 5374, Emerging Lithographic Technologies VIII
KEYWORDS: Lithography, Electron beam lithography, Manufacturing, Control systems, Photomasks, Optical alignment, Electron beam direct write lithography, Photoresist processing, Semiconducting wafers, Optics manufacturing

PROCEEDINGS ARTICLE | June 16, 2003
Proc. SPIE. 5037, Emerging Lithographic Technologies VII
KEYWORDS: Electron beam lithography, Optical lithography, Scanners, Error analysis, Distortion, Photomasks, Optical alignment, Electron beam direct write lithography, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | June 16, 2003
Proc. SPIE. 5037, Emerging Lithographic Technologies VII
KEYWORDS: Oxides, Lithography, Electron beam lithography, Etching, Scanners, Chemistry, Photomasks, CMOS technology, Optical alignment, Semiconducting wafers

Showing 5 of 6 publications
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