Dr. James F. Cameron
Technical Fellow
SPIE Involvement:
Conference Program Committee | Author
Area of Expertise:
Lithography , Patterning Materials , Photoresists , Electronic Materials , Device Integration , Material Design and Synthesis
Profile Summary

Summary
Recognized expert in the field of materials for advanced semiconductor manufacture. Over 25 years of experience in electronic materials including photoactive materials, photoresists and underlayer films used in the production of state of the art transistor devices. Proven track record of developing innovative materials and products to support semiconductor device scaling: Chemically Amplified (CA) resists [193nm, 248nm & Extreme Ultra-Violet (EUV)], Bottom Antireflective Coatings (BARCs) (including Organic, Silicon & Developable types) and Spin on Carbon (SOC) Underlayers.

Overview of Skills and Expertise
• Expert in organic chemistry, polymer synthesis and organic photochemistry.
• Detailed understanding of advanced materials characterization for electronic materials.
• Extensive experience in all aspects of advanced lithographic patterning.
• In depth knowledge of advanced semiconductor device manufacture.
• Deep insight into product development process including robust design for quality specifications.
• Proven ability to introduce novel technology into the semiconductor industry.
Publications (44)

Proceedings Article | 1 May 2023 Poster + Paper
Conner Hoelzel, Li Cui, Benjamin Naab, Jong Park, Philjae Kang, Kenneth Hernandez, Suzanne Coley, Stefan Alexandrescu, Rochelle Rena, James Cameron, Emad Aqad
Proceedings Volume 12498, 124981V (2023) https://doi.org/10.1117/12.2658981
KEYWORDS: Photoacid generators, Extreme ultraviolet lithography, Electrons, Extreme ultraviolet, Polymers, Design and modelling, Lithography, Materials properties, Line width roughness, Semiconducting wafers

Proceedings Article | 1 May 2023 Presentation + Paper
Proceedings Volume 12498, 124980U (2023) https://doi.org/10.1117/12.2655986
KEYWORDS: Polymers, Polymethylmethacrylate, Spectroscopy, Molecular interactions, Molecules, FT-IR spectroscopy, Atomic layer deposition, Vacuum, Silicon, Semiconducting wafers

Proceedings Article | 30 April 2023 Presentation
Mingqi Li, Emad Aqad, Tomas Marangoni, James Cameron, Paul LaBeaume, Jung-June Lee, Jae-Hwan Sim, Choong Bong Lee, Xisen Hou, Michael Eller, Stanislav Verkhorurov, Emile Schweikert, Peter Trefonas, Chengbai Xu
Proceedings Volume 12498, 124980H (2023) https://doi.org/10.1117/12.2657445
KEYWORDS: Optical lithography, Thin films, Semiconductors, Semiconductor manufacturing, Photoresist materials, Manufacturing, Lithography

Proceedings Article | 22 February 2021 Presentation + Paper
Emad Aqad, ChoongBong Lee, Suzanne Coley, Ke Yang, Li Cui, Manibarsha Goswami, Bhooshan Popere, Tomas Marangoni, James Cameron, James Thackeray
Proceedings Volume 11609, 116090I (2021) https://doi.org/10.1117/12.2583642
KEYWORDS: Extreme ultraviolet, Polymers, Absorption, Quantum efficiency, Imaging systems, Yield improvement, Systems modeling, Stochastic processes, Modulation, Lithography

Proceedings Article | 22 February 2021 Presentation + Paper
Proceedings Volume 11612, 116120Q (2021) https://doi.org/10.1117/12.2586516
KEYWORDS: Nanostructures, Photomasks, Nanolithography, Control systems, Ultraviolet radiation, Thin films, Nanodomains, Interfaces, Fabrication, Electron beams

Showing 5 of 44 publications
Conference Committee Involvement (5)
Advances in Patterning Materials and Processes XLI
26 February 2024 | San Jose, California, United States
Advances in Patterning Materials and Processes XL
27 February 2023 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXIX
25 April 2022 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXVIII
22 February 2021 | Online Only, California, United States
Advances in Patterning Materials and Processes XXXVII
24 February 2020 | San Jose, California, United States
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