Dr. Dieter Van den Heuvel
Process Engineer at IMEC
SPIE Involvement:
Author
Publications (38)

PROCEEDINGS ARTICLE | March 23, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Optical lithography, Etching, Metals, Copper, Resistance, Photomasks, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers, Tin

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Wafer-level optics, Oxides, Signal to noise ratio, Reticles, Inspection, Optical inspection, Wafer inspection, Photomasks, Extreme ultraviolet, Semiconducting wafers

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Lithography, Statistical analysis, Image segmentation, Manufacturing, Scanning electron microscopy, Process control, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Line edge roughness, Semiconducting wafers, Stochastic processes, Overlay metrology

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Optical lithography, Contamination, Etching, Metals, Scanners, Photoresist materials, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers, Photoresist developing, Absorption

PROCEEDINGS ARTICLE | July 9, 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Mirrors, Defect detection, Scanners, Inspection, Atomic force microscopy, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

SPIE Journal Paper | July 2, 2015
JM3 Vol. 14 Issue 03
KEYWORDS: Etching, Scanning electron microscopy, Silicon, Inspection, Semiconducting wafers, Diffractive optical elements, Defect inspection, Thin film coatings, Directed self assembly

Showing 5 of 38 publications
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