Dr. Mircea V. Dusa
Fellow/Founding Member of Technol. Development Ctr at Imec
SPIE Involvement:
Author | Instructor
Publications (132)

Proceedings Article | 10 April 2024 Presentation + Paper
Syamashree Roy, Arame Thiam, Kaushik Sah, Yannick Feurprier, Nobuyuki Fukui, Kathleen Nafus, Kenichi Miyaguchi, Dieter Van den Heuvel, Balakumar Baskaran, Joost Bekaert, Andrew Cross, Mircea Dusa, Victor Blanco Carballo
Proceedings Volume 12953, 129530X (2024) https://doi.org/10.1117/12.3010868
KEYWORDS: Optical lithography, Semiconducting wafers, Logic, Scanning electron microscopy, Lithography, Design, Extreme ultraviolet

Proceedings Article | 26 May 2022 Presentation + Paper
Mihir Gupta, Paulina Rincon Delgadillo, Hyo Seon Suh, Sandip Halder, Mircea Dusa
Proceedings Volume 12053, 120530Q (2022) https://doi.org/10.1117/12.2616679
KEYWORDS: Critical dimension metrology, Statistical analysis, Scanning electron microscopy, Optical inspection, Materials processing, Inspection, Image processing, Metrology, Lithography

Proceedings Article | 12 October 2021 Presentation + Paper
Proceedings Volume 11854, 118540C (2021) https://doi.org/10.1117/12.2600937
KEYWORDS: Stochastic processes, Semiconducting wafers, Ruthenium, Inspection, Extreme ultraviolet lithography, Line edge roughness

Proceedings Article | 12 October 2021 Poster + Presentation + Paper
Proceedings Volume 11854, 1185418 (2021) https://doi.org/10.1117/12.2600938
KEYWORDS: Etching, Logic, Critical dimension metrology, Inspection, Extreme ultraviolet lithography, Semiconducting wafers, Electron beam lithography, Optical lithography, Metrology, Diffractive optical elements

Proceedings Article | 24 March 2020 Presentation
Proceedings Volume 11329, 113290U (2020) https://doi.org/10.1117/12.2569606

Showing 5 of 132 publications
Proceedings Volume Editor (4)

SPIE Conference Volume | 22 March 2011

SPIE Conference Volume | 3 March 2010

SPIE Conference Volume | 13 March 2009

SPIE Conference Volume | 20 March 2008

Conference Committee Involvement (12)
SPIE Advanced Lithography
21 February 2016 | San Jose, United States
SPIE Advanced Lithography
22 February 2015 | San Jose, United States
SPIE Advanced Lithography
23 February 2014 | San Jose, United States
SPIE Advanced Lithography
24 February 2013 | San Jose, United States
Optical Microlithography XXV
14 February 2012 | San Jose, California, United States
Showing 5 of 12 Conference Committees
Course Instructor
SC885: Principles and Practical Implementation of Multiple Patterning
This course provides attendees with a basic working knowledge of the fundamentals and implementation principles of what industry calls with a generic name "double patterning” but in reality it is a multi-patterning technology. This course will tackle the interdisciplinary characteristics of the multipatterning processes examining several pitch division techniques, from double to triple, quadruple or even more split steps, with focus on the key technology components, such as, but not limited to, (a) resolution and lithography options, (b) layout, ground rules and split compliance, (c) process and material, that are combined to create an electrically functional device layer from multiple