Patricia Marmillion
Project Engineer
SPIE Involvement:
Publications (18)

Proceedings Article | 2 May 2008 Paper
Proceedings Volume 6792, 679202 (2008)
KEYWORDS: Photomasks, Binary data, Optical proximity correction, Data processing, Pellicles, Phase shifts, Data conversion, Microelectronics, Printing, Manufacturing

Proceedings Article | 1 April 2008 Paper
Proceedings Volume 6921, 692120 (2008)
KEYWORDS: Glasses, Cavitation, Particles, Extreme ultraviolet, Surface finishing, Acoustics, Quartz, Inspection, Photomasks, Atomic force microscopy

Proceedings Article | 16 November 2007 Paper
Proceedings Volume 6730, 67304L (2007)
KEYWORDS: Particles, Quartz, Scanning probe microscopy, Photomasks, Chemistry, Extreme ultraviolet lithography, Liquids, Mask cleaning, Ions, Vacuum ultraviolet

Proceedings Article | 23 October 2007 Paper
Proceedings Volume 6730, 673003 (2007)
KEYWORDS: Photomasks, Binary data, Optical proximity correction, Pellicles, Glasses, Manufacturing, Data processing, Photomask technology, Inspection, Logic

Proceedings Article | 3 May 2007 Paper
Proceedings Volume 6533, 653303 (2007)
KEYWORDS: Photomasks, Optical proximity correction, Binary data, Data processing, Pellicles, Data conversion, Microelectronics, Printing, Logic, Phase shifts

Showing 5 of 18 publications
Proceedings Volume Editor (1)

Conference Committee Involvement (1)
Photomask and Next Generation Lithography Mask Technology XIV
17 April 2007 | Yokohama, Japan
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