Dr. Michael J. Lercel
Senior Director Strategic Marketing
SPIE Involvement:
Publications (38)

Proceedings Article | 10 October 2019 Paper
Proceedings Volume 11148, 111480Y (2019) https://doi.org/10.1117/12.2535396
KEYWORDS: Pellicles, Extreme ultraviolet, Scanners, Reticles, Inspection, Extreme ultraviolet lithography, Manufacturing, Deep ultraviolet, Statistical modeling, Statistical analysis

Proceedings Article | 26 March 2019 Presentation + Paper
Proceedings Volume 10957, 109570U (2019) https://doi.org/10.1117/12.2514874
KEYWORDS: Particles, Reticles, Scanners, Pellicles, Plasma, Extreme ultraviolet, Particle contamination

Proceedings Article | 25 October 2016 Paper
Proceedings Volume 9985, 99850T (2016) https://doi.org/10.1117/12.2246796
KEYWORDS: Extreme ultraviolet, Photomasks, Optical lithography, Inspection, Statistical analysis, Yield improvement, Statistical modeling, Manufacturing, Extreme ultraviolet lithography, Factor analysis

Proceedings Article | 2 October 2014 Paper
Proceedings Volume 9236, 92360E (2014) https://doi.org/10.1117/12.2069302
KEYWORDS: Signal to noise ratio, Light scattering, Inspection, Semiconducting wafers, Defect inspection, Interference (communication), Contrast transfer function, Scanning electron microscopy, Scattering, Signal detection

SPIE Journal Paper | 29 June 2012
Igor Fomenkov, Bruno La Fontaine, Daniel Brown, Imtiaz Ahmad, Peter Baumgart, Norbert Bowering, David Brandt, Alexander Bykanov, Silvia De Dea, Alex Ershov, Nigel Farrar, Daniel Golich, Michael Lercel, David Myers, Chirag Rajyaguru, Shailendra Srivastava, Yezheng Tao, Georgiy Vaschenko
JM3, Vol. 11, Issue 02, 021110, (June 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.2.021110
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Lithography, Tin, Reflectivity, Semiconducting wafers, Mirrors, Scanners, Gas lasers

Showing 5 of 38 publications
Proceedings Volume Editor (4)

SPIE Conference Volume | 13 March 2007

SPIE Conference Volume | 10 March 2006

SPIE Conference Volume | 6 May 2005

SPIE Conference Volume | 20 May 2004

Conference Committee Involvement (13)
Extreme Ultraviolet (EUV) Lithography VI
23 February 2015 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography V
24 February 2014 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography IV
25 February 2013 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography III
13 February 2012 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography II
28 February 2011 | San Jose, California, United States
Showing 5 of 13 Conference Committees
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