Dr. Michael J. Lercel
Director Strategic Marketing at ASML
SPIE Involvement:
Conference Program Committee | Conference Chair | Conference Co-Chair | Author
Publications (40)

PROCEEDINGS ARTICLE | October 25, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Optical lithography, Statistical analysis, Manufacturing, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Yield improvement, Statistical modeling, Factor analysis

PROCEEDINGS ARTICLE | October 2, 2014
Proc. SPIE. 9236, Scanning Microscopies 2014
KEYWORDS: Signal to noise ratio, Scattering, Light scattering, Inspection, Interference (communication), Scanning electron microscopy, Semiconducting wafers, Signal detection, Contrast transfer function, Defect inspection

SPIE Journal Paper | June 29, 2012
JM3 Vol. 11 Issue 02
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Lithography, Tin, Reflectivity, Semiconducting wafers, Mirrors, Scanners, Gas lasers

PROCEEDINGS ARTICLE | March 23, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Mirrors, Scanners, Coating, Manufacturing, Laser scanners, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Plasma, Tin

PROCEEDINGS ARTICLE | March 23, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Mirrors, Light sources, Ions, Reflectivity, Carbon dioxide lasers, Control systems, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Tin

PROCEEDINGS ARTICLE | April 7, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Mirrors, Scanners, Reflectivity, Carbon dioxide lasers, Laser scanners, Extreme ultraviolet, Extreme ultraviolet lithography, 3D scanning, Semiconducting wafers, Plasma

Showing 5 of 40 publications
Conference Committee Involvement (13)
Extreme Ultraviolet (EUV) Lithography VI
23 February 2015 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography V
24 February 2014 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography IV
25 February 2013 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography III
13 February 2012 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography II
28 February 2011 | San Jose, California, United States
Showing 5 of 13 published special sections
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top