Prof. Takeshi Higashiguchi
Associate Professor at Utsunomiya Univ
SPIE Involvement:
Author
Publications (28)

PROCEEDINGS ARTICLE | May 11, 2017
Proc. SPIE. 10238, High-Power, High-Energy, and High-Intensity Laser Technology III
KEYWORDS: Stars, Luminescence, Quantum efficiency, Head, Solids, Thermal effects, Diodes, Optical simulations, Temperature metrology, Absorption

PROCEEDINGS ARTICLE | July 9, 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Opacity, Ions, Numerical simulations, Extreme ultraviolet, Optical simulations, Picosecond phenomena, Pulsed laser operation, Tellurium, Plasma, Tin

PROCEEDINGS ARTICLE | July 9, 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Metrology, Laser energy, Nd:YAG lasers, Inspection, Photomasks, Extreme ultraviolet, Picosecond phenomena, Pulsed laser operation, Plasma, Tin

PROCEEDINGS ARTICLE | December 11, 2012
Proc. SPIE. 8678, Short-Wavelength Imaging and Spectroscopy Sources
KEYWORDS: Ions, Nd:YAG lasers, Reflectivity, Time metrology, Extreme ultraviolet, Extreme ultraviolet lithography, Picosecond phenomena, Gadolinium, Pulsed laser operation, Plasma

PROCEEDINGS ARTICLE | March 23, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Microscopes, Mirrors, X-rays, Ions, Extreme ultraviolet, Bismuth, Picosecond phenomena, Pulsed laser operation, Plasma, Tin

PROCEEDINGS ARTICLE | March 23, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Lithography, Ions, Plasmas, Nd:YAG lasers, Carbon dioxide lasers, Extreme ultraviolet, Gadolinium, Pulsed laser operation, EUV optics, Tin

Showing 5 of 28 publications
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