Dr. Zhuan Liu
Senior Scientist at Nanometrics Inc
SPIE Involvement:
Author
Publications (15)

SPIE Journal Paper | October 16, 2014
JM3 Vol. 13 Issue 04
KEYWORDS: Critical dimension metrology, Scatterometry, Line edge roughness, Reactive ion etching, Metrology, Scatter measurement, Semiconducting wafers, Optics manufacturing, Magnetism, Etching

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Metrology, Etching, Manufacturing, Magnetism, Scatterometry, Measurement devices, Photomasks, Critical dimension metrology, Reactive ion etching, Semiconducting wafers

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Ellipsometry, Metrology, Data modeling, Manufacturing, Scatterometry, Critical dimension metrology, Line edge roughness, Reactive ion etching, Semiconducting wafers, Scatter measurement

PROCEEDINGS ARTICLE | April 10, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Ellipsometry, Metrology, Scanners, 3D modeling, Scanning electron microscopy, Scatterometry, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | April 5, 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Ellipsometry, Metrology, Optical lithography, Cadmium, Scatterometry, Extreme ultraviolet, Extreme ultraviolet lithography, Double patterning technology, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | April 20, 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Metrology, Etching, Scanning electron microscopy, Scatterometry, Reflectometry, Process control, Double patterning technology, Critical dimension metrology, Semiconducting wafers, Scatter measurement

Showing 5 of 15 publications
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