Dr. Zhuan Liu
Senior Scientist at Nanometrics Inc
SPIE Involvement:
Author
Publications (15)

SPIE Journal Paper | October 16, 2014
JM3 Vol. 13 Issue 04
KEYWORDS: Critical dimension metrology, Scatterometry, Line edge roughness, Reactive ion etching, Metrology, Scatter measurement, Semiconducting wafers, Optics manufacturing, Magnetism, Etching

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Reactive ion etching, Scatterometry, Critical dimension metrology, Metrology, Magnetism, Manufacturing, Photomasks, Etching, Measurement devices, Semiconducting wafers

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Scatterometry, Critical dimension metrology, Line edge roughness, Scatter measurement, Semiconducting wafers, Metrology, Reactive ion etching, Manufacturing, Ellipsometry, Data modeling

PROCEEDINGS ARTICLE | April 10, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Critical dimension metrology, Scatterometry, Extreme ultraviolet lithography, Extreme ultraviolet, Semiconducting wafers, Metrology, Scanners, 3D modeling, Scanning electron microscopy, Ellipsometry

PROCEEDINGS ARTICLE | April 5, 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Scatterometry, Extreme ultraviolet lithography, Critical dimension metrology, Extreme ultraviolet, Metrology, Semiconducting wafers, Double patterning technology, Cadmium, Optical lithography, Ellipsometry

PROCEEDINGS ARTICLE | April 20, 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Scatterometry, Critical dimension metrology, Semiconducting wafers, Metrology, Double patterning technology, Etching, Process control, Scatter measurement, Reflectometry, Scanning electron microscopy

Showing 5 of 15 publications
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