Dr. Oleg Kritsun
Director at INAM USA
SPIE Involvement:
Author
Publications (22)

PROCEEDINGS ARTICLE | April 10, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Ellipsometry, Metrology, Scanners, 3D modeling, Scanning electron microscopy, Scatterometry, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | April 10, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Lithography, Metrology, Scatterometry, 3D metrology, Spectroscopic ellipsometry, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Neodymium, Semiconducting wafers

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Microscopes, Diffraction, Etching, Inspection, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Phase shifts, Diffraction gratings

PROCEEDINGS ARTICLE | April 5, 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: 3D acquisition, Spectroscopy, 3D modeling, Time metrology, 3D metrology, Finite element methods, Reflectance spectroscopy, Semiconducting wafers, Overlay metrology, Diffraction gratings

PROCEEDINGS ARTICLE | April 5, 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Ellipsometry, Metrology, Optical lithography, Cadmium, Scatterometry, Extreme ultraviolet, Extreme ultraviolet lithography, Double patterning technology, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 23, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Lithography, Deep ultraviolet, Printing, Monte Carlo methods, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Showing 5 of 22 publications
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