Jung-Chul Park
RET Engineer
SPIE Involvement:
Publications (15)

Proceedings Article | 27 September 2013 Paper
Bumsung Lee, Jungwhan Park, Daewon Lee, Daesung Kim, Jungchul Park
Proceedings Volume 8829, 88290H (2013) https://doi.org/10.1117/12.2024786
KEYWORDS: Organic light emitting diodes, Diodes, Ultraviolet radiation, Interfaces, Excitons, Laser induced fluorescence, Aluminum, Absorption, Electroluminescence, Control systems

Proceedings Article | 23 March 2009 Paper
Jie Li, Zhuan Liu, Silvio Rabello, Prasad Dasari, Oleg Kritsun, Catherine Volkman, Jungchul Park, Lovejeet Singh
Proceedings Volume 7272, 727207 (2009) https://doi.org/10.1117/12.814706
KEYWORDS: Overlay metrology, Critical dimension metrology, Semiconducting wafers, Scatterometry, Double patterning technology, Error analysis, Reflectivity, Metrology, Cadmium, Diffraction gratings

Proceedings Article | 26 March 2007 Paper
Proceedings Volume 6520, 65200K (2007) https://doi.org/10.1117/12.713277
KEYWORDS: Photomasks, SRAF, Lithography, Optical proximity correction, Photoresist processing, Metals, Lithographic illumination, Printing, Resolution enhancement technologies, Fiber optic illuminators

Proceedings Article | 20 October 2006 Paper
Proceedings Volume 6349, 634922 (2006) https://doi.org/10.1117/12.692921
KEYWORDS: Photomasks, Optical lithography, Optical proximity correction, Double patterning technology, Etching, Model-based design, Printing, Manufacturing, Critical dimension metrology, Photoresist processing

Proceedings Article | 20 May 2006 Paper
Proceedings Volume 6283, 62830U (2006) https://doi.org/10.1117/12.681854
KEYWORDS: Photomasks, Nanoimprint lithography, Diffraction, Lithography, Printing, Optical proximity correction, Resolution enhancement technologies, Optical lithography, Manufacturing, Metals

Showing 5 of 15 publications
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