Jieh-Jang Chen
Senior Engineer at Taiwan Semiconductor Manufacturing Co Ltd
SPIE Involvement:
Publications (12)

Proceedings Article | 19 March 2018 Paper
Proceedings Volume 10584, 105841E (2018) https://doi.org/10.1117/12.2302685
KEYWORDS: Photomasks, Vestigial sideband modulation, Monte Carlo methods, Model-based design, Beam shaping, Critical dimension metrology, Electron beam lithography, Lithography, Process modeling, Optical lithography

Proceedings Article | 23 October 2015 Paper
Chien-Cheng Chen, Tzu-Ling Liu, Shao-Wen Chang, Yen-Cheng Ho, Chia-Jen Chen, Chih-Cheng Lin, Ta-Cheng Lien, Hsin-Chang Lee, Anthony Yen
Proceedings Volume 9635, 963508 (2015) https://doi.org/10.1117/12.2200961
KEYWORDS: Image registration, Photomasks, Mask making, Electron beam lithography, Optical lithography, Electrons, Quartz, Pellicles, Scattering, Etching

Proceedings Article | 7 April 2011 Paper
Proceedings Volume 7969, 79691D (2011) https://doi.org/10.1117/12.881583
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Inspection, Etching, Extreme ultraviolet, Manufacturing, Deposition processes, Defect inspection, Chromium, Lithography

Proceedings Article | 29 March 2011 Paper
Proceedings Volume 7971, 797106 (2011) https://doi.org/10.1117/12.879485
KEYWORDS: Photomasks, Semiconducting wafers, Overlay metrology, Scanners, Image registration, Error analysis, Optical lithography, Lithography, Double patterning technology, Reticles

Proceedings Article | 4 May 2005 Paper
Shih-Chi Fu, Jieh-Jang Chen, Feng-Jia Shiu, Ching-Sen Kuo, Gwo-Yun Shiau, Chia-Shiung Tsia, Chung Wang
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.601435
KEYWORDS: Oxides, High power microwaves, Photoresist materials, Semiconducting wafers, Contamination, Surface roughness, Atomic force microscopy, Liquids, Safety, Polymers

Showing 5 of 12 publications
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