Dr. Rick Lai
Senior Engineer at Taiwan Semiconductor Manufacturing Co Ltd
SPIE Involvement:
Author
Publications (10)

PROCEEDINGS ARTICLE | October 4, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Glasses, Particles, Inspection, Oxygen, Photomasks, SRAF, Cavitation, Acoustics, Mask cleaning, Plasma

PROCEEDINGS ARTICLE | September 20, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Reticles, Contamination, Visualization, Air contamination, Scanners, Inspection, Photomasks, Optical proximity correction, Semiconducting wafers, Defect inspection

PROCEEDINGS ARTICLE | April 16, 2012
Proc. SPIE. 8352, 28th European Mask and Lithography Conference
KEYWORDS: Lithography, Diffraction, Deep ultraviolet, 3D modeling, Near field, Photomasks, Extreme ultraviolet, Optical proximity correction, Spherical lenses, Semiconducting wafers

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Defect detection, Metals, Inspection, Image resolution, Photomasks, Image classification, Optical proximity correction, Classification systems, Defect inspection

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Signal to noise ratio, Calibration, Image processing, Scanning electron microscopy, Photomasks, Optical proximity correction, Mask making, Critical dimension metrology, Semiconducting wafers, Holons

PROCEEDINGS ARTICLE | September 29, 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Lithography, Defect detection, Image processing, Inspection, Image restoration, Scanning electron microscopy, Image transmission, Photomasks, Extreme ultraviolet, Optical proximity correction

Showing 5 of 10 publications
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