Dr. Johannes Ruoff
Optical Designer at Carl Zeiss SMT GmbH
SPIE Involvement:
Publications (15)

SPIE Journal Paper | 4 October 2018
OE, Vol. 57, Issue 10, 101709, (October 2018) https://doi.org/10.1117/12.10.1117/1.OE.57.10.101709
KEYWORDS: Wavefronts, Optical design, Optical engineering, Error analysis, Zernike polynomials, Ray tracing, Statistical analysis, Vignetting, Visualization, Light emitting diodes

Proceedings Article | 27 November 2017 Paper
Proceedings Volume 10590, 1059004 (2017) https://doi.org/10.1117/12.2294613

Proceedings Article | 27 September 2016 Paper
Markus Seesselberg, Bernd Kleemann, Johannes Ruoff
Proceedings Volume 9953, 995306 (2016) https://doi.org/10.1117/12.2236604
KEYWORDS: Diffractive optical elements, Ray tracing, Far-field diffraction, Diffraction gratings, Computer generated holography, Geometrical optics, Optical design software, Refraction, Far-field diffraction, Diffraction, Refractive index

Proceedings Article | 1 April 2013 Paper
Proceedings Volume 8679, 86791Q (2013) https://doi.org/10.1117/12.2011432
KEYWORDS: Photomasks, Image quality standards, Nanoimprint lithography, Lithography, Molybdenum, Binary data, Optical proximity correction, Extreme ultraviolet, Silicon, Multilayers

Proceedings Article | 5 April 2011 Paper
Dirk Hellweg, Johannes Ruoff, Alois Herkommer, Joachim Stühler, Thomas Ihl, Heiko Feldmann, Michael Ringel, Ulrich Strößner, Sascha Perlitz, Wolfgang Harnisch
Proceedings Volume 7969, 79690H (2011) https://doi.org/10.1117/12.879422
KEYWORDS: Extreme ultraviolet, Scanners, Extreme ultraviolet lithography, Photomasks, EUV optics, Reticles, Projection systems, Optics manufacturing, Charge-coupled devices, Artificial intelligence

Showing 5 of 15 publications
Conference Committee Involvement (3)
Modeling Aspects in Optical Metrology IX
26 June 2023 | Munich, Germany
Modeling Aspects in Optical Metrology VIII
21 June 2021 | Online Only, Germany
Modeling Aspects in Optical Metrology VII
24 June 2019 | Munich, Germany
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