Dr. Eelco van Setten
Principal architect EUV Imaging at ASML Netherlands B.V.
SPIE Involvement:
Author
Publications (51)

PROCEEDINGS ARTICLE | May 29, 2018
Proc. SPIE. 10694, Computational Optics II
KEYWORDS: Photomasks, Nanoimprint lithography, Diffraction, Extreme ultraviolet lithography, Lithography, Extreme ultraviolet, Lithographic illumination, Imaging systems, Reflectivity, Critical dimension metrology

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Extreme ultraviolet lithography, Scanners, Imaging systems, Manufacturing, Lens design, Sensors, Optical proximity correction, Modeling, Photomasks, Lithography

SPIE Journal Paper | October 30, 2017
JM3 Vol. 16 Issue 04
KEYWORDS: Photomasks, Scanners, Semiconducting wafers, Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, Mirrors, Nanoimprint lithography, Projection systems, Wafer-level optics

PROCEEDINGS ARTICLE | October 30, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Extreme ultraviolet lithography, Nanoimprint lithography, Photomasks, Extreme ultraviolet, Reflectivity, Scanners, Mirrors, Semiconducting wafers, Reticles, Imaging systems

PROCEEDINGS ARTICLE | October 26, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Lithographic illumination, Source mask optimization, Diffraction, Photomasks, Extreme ultraviolet lithography, Immersion lithography, Fiber optic illuminators, Lithography, Optimization (mathematics)

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Extreme ultraviolet lithography, Photomasks, Semiconducting wafers, Mirrors, Reticles, Projection systems, Optical design, Imaging systems, Extreme ultraviolet

Showing 5 of 51 publications
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