Mr. John M. Whittey
Field Marketing Director at
SPIE Involvement:
Conference Program Committee | Author
Area of Expertise:
Scanning Electron Microscopy , Metrology , Semiconductor equipment , E-beam Lithography , Photomasks , Wafer Fabs
Publications (16)

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Semiconductors, Reticles, Metrology, Manufacturing, Inspection, Signal processing, Process control, Photomasks, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Opacity, Manufacturing, Inspection, Electron microscopes, Optical testing, Scanning electron microscopy, Photomasks, Critical dimension metrology, Semiconducting wafers, Wafer manufacturing

PROCEEDINGS ARTICLE | April 2, 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Reticles, Metrology, Spatial frequencies, Error analysis, Manufacturing, Image registration, Photomasks, Semiconducting wafers, Overlay metrology, Data analysis

PROCEEDINGS ARTICLE | September 23, 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Lithography, Reticles, Metrology, Lithographic illumination, Deep ultraviolet, Laser development, Image registration, Pellicles, Photomasks, Double patterning technology

PROCEEDINGS ARTICLE | September 23, 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Reticles, Metrology, Statistical analysis, Calibration, Error analysis, Manufacturing, Image registration, Photomasks, Semiconducting wafers, Data analysis

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Detection and tracking algorithms, Pattern recognition, Reflectivity, Scanning electron microscopy, Photomasks, Optical simulations, Beam shaping, Optical alignment, Critical dimension metrology, Algorithm development

Showing 5 of 16 publications
Conference Committee Involvement (2)
Photomask Technology
15 September 2009 | Monterey, California, United States
Photomask Technology
7 October 2008 | Monterey, California, United States
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