Mr. Jun Ishikawa
at Nikon Corp
SPIE Involvement:
Author
Publications (13)

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Lithography, Metrology, Optical parametric oscillators, Scanners, Manufacturing, Distortion, Process control, Optical alignment, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Wafer-level optics, Reticles, Data modeling, Calibration, Scanners, Wavefronts, Control systems, Distortion, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 13, 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Reticles, Optical lithography, Scanners, Wavefront aberrations, Distortion, Computer programming, Double patterning technology, Immersion lithography, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 23, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Scanners, Manufacturing, Control systems, Computer programming, Double patterning technology, Immersion lithography, Optical alignment, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 10, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Eye, Atrial fibrillation, Interferometers, Scanners, Control systems, Computer programming, Double patterning technology, Optical alignment, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | December 11, 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Eye, Interferometers, Calibration, Error analysis, Manufacturing, Computer programming, Double patterning technology, Optical alignment, Semiconducting wafers, Overlay metrology

Showing 5 of 13 publications
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