Dr. Sang-Ho Lee
at SK Hynix Inc
SPIE Involvement:
Publications (10)

Proceedings Article | 27 April 2023 Poster + Paper
Shlomit Katz, Suk Won Park, Joonsang You, Hyunjun Kim, Honggoo Lee, Jungchan Kim, Dongyoung Lee, Hongbok Yeon, Joonseuk Lee, Sang-Ho Lee, Jae Wook Seo, Dor Yehuda, Junho Kim, Hongcheon Yang, Dohwa Lee, Nanglyeom Oh, Dongsub Choi, Wayne Zhou, Hedvi Spielberg, Ohad Bachar
Proceedings Volume 12496, 1249626 (2023) https://doi.org/10.1117/12.2655681
KEYWORDS: Metrology, Overlay metrology, High volume manufacturing, Optical parametric oscillators, Optical gratings, Visualization

Proceedings Article | 13 June 2022 Presentation
Proceedings Volume PC12053, PC120530N (2022) https://doi.org/10.1117/12.2613931
KEYWORDS: Overlay metrology, Image processing, Yield improvement, Metrology, Line edge roughness, Process control, Critical dimension metrology, Scanning electron microscopy, Optical lithography, Inspection

Proceedings Article | 26 May 2022 Poster + Presentation + Paper
Philip Groeger, Ulrich Denker, Robin Zech, Stefan Buhl, Matthias Ruhm, Mingyu Kim, Hongseok Jang, Chunsoo Kang, Dongyoung Lee, Hyunjun Kim, Sukwon Park, Bohye Kim, Honggoo Lee, Sangho Lee, Dongsub Choi, Jeonghoon Lee
Proceedings Volume 12053, 1205314 (2022) https://doi.org/10.1117/12.2607571
KEYWORDS: Semiconducting wafers, Data modeling, Scanners, Critical dimension metrology, Performance modeling, Mathematical modeling, Etching, Error analysis, Algorithm development, Zernike polynomials, Modeling, Modeling and simulation

Proceedings Article | 26 May 2022 Presentation + Paper
Proceedings Volume 12053, 120530E (2022) https://doi.org/10.1117/12.2608053
KEYWORDS: Overlay metrology, Process control, Optical lithography, Metrology, Inspection, Semiconducting wafers, Data modeling, Wafer-level optics, Optical properties, Optical design

Proceedings Article | 26 May 2022 Poster + Paper
Proceedings Volume 12053, 120531Z (2022) https://doi.org/10.1117/12.2613981
KEYWORDS: Semiconducting wafers, Overlay metrology, Process control, Integrated circuits, Wafer-level optics, Scanners, Principal component analysis, Manufacturing, Inspection, Accuracy assessment

Showing 5 of 10 publications
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