Mr. Ki Lyoung Lee Profile

Ki Lyoung Lee

at SK Hynix Inc

SPIE Involvement:

Author

Publications (13)

Proceedings Article | 25 May 2022 Poster + Paper

Metal oxide resist (MOR) EUV lithography processes for DRAM application

Shinichiro Kawakami, Tomoya Onitsuka, Yuya Kamei, Satoru Shimura, Chan Ha Park, Sang Ho Lee, Hong Goo Lee, Jae Wook Seo, Jin il Kim, Jun ho Roh, Jin Hyung Kim, Ki Lyoung Lee, Seiji Nagahara, Jeoung Yun Kim, Jang Hwan Kim, Shingo Inaba, Jong Eun Park

Proceedings Volume 12055, 120550N (2022) https://doi.org/10.1117/12.2613974

KEYWORDS: Metals, Contamination, Semiconducting wafers, Optical lithography, Extreme ultraviolet lithography, Contamination control, Coating, Bridges, Manufacturing, Oxides

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Proceedings Article | 26 March 2019 Presentation + Paper

Staggered pillar patterning using 0.33NA EUV lithography

Danilo De Simone, Romuald Blanc, Jeroen Van de Kerkhove, Amir-Hossein Tamaddon, Roberto Fallica, Lieve Van Look, Nouredine Rassoul, Frederic Lazzarino, Nadia Vandenbroeck, Pieter Vanelderen, Gian Lorusso, Frieda Van Roey, Anne-Laure Charley, Geert Vandenberghe, Kurt Ronse, Kilyoung Lee, Junghyung Lee, Sarohan Park, Chang-Moon Lim, Chan-Ha Park

Proceedings Volume 10957, 109570T (2019) https://doi.org/10.1117/12.2515170

KEYWORDS: Optical lithography, Extreme ultraviolet lithography, Semiconducting wafers, Etching, Extreme ultraviolet, Critical dimension metrology, Image processing, Failure analysis, Scanning electron microscopy, Image analysis

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Proceedings Article | 23 March 2012 Paper

Comparison study for 3x-nm contact hole CD uniformity between EUV lithography and ArF immersion double patterning

Keundo Ban, Junggun Heo, Hyunkyung Shim, Minkyung Park, Kilyoung Lee, Sunyoung Koo, Jaeheon Kim, Cheolkyu Bok, Myoungsoo Kim, Hyosang Kang

Proceedings Volume 8322, 83221A (2012) https://doi.org/10.1117/12.916119

KEYWORDS: Double patterning technology, Extreme ultraviolet lithography, Extreme ultraviolet, Critical dimension metrology, Line width roughness, Photomasks, Optical lithography, Etching, Metrology, Edge roughness

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Proceedings Article | 16 April 2011 Paper

Patterning process study for 30nm hole

Kilyoung Lee, Cheolkyu Bok, Jaeheon Kim, Byounghoon Lee, Jongsik Bang, Hyunkyung Shim, Sungjin Kim, James Moon, Donggyu Yim, Sung-Ki Park

Proceedings Volume 7972, 79720P (2011) https://doi.org/10.1117/12.880906

KEYWORDS: Optical lithography, Photomasks, Critical dimension metrology, Nanoimprint lithography, Chromium, Etching, Double patterning technology, Scanners, Image processing, Photoresist developing

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Proceedings Article | 31 March 2010 Paper

Mesh patterning process for 40nm contact hole

Kilyoung Lee, Cheolkyu Bok, Jaeheon Kim, Hyunkyung Shim, Junggun Heo, Junghyung Lee, Hyeong-Soo Kim, Donggu Yim, Sung-Ki Park

Proceedings Volume 7639, 76391S (2010) https://doi.org/10.1117/12.846388

KEYWORDS: Optical lithography, Double patterning technology, Image processing, Photoresist processing, Lithography, Etching, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Coating

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Proceedings Article | 10 April 2009 Paper

Reflection control for immersion lithography: a single organic antireflectant over high-reflective substrates for double patterning

Sabrina Wong, Jeong Yun Yu, Sue Ryeon Kim, Mike Mori, Amy Kwok, Kathleen O'Connell, George Barclay, Ki Lyoung Lee, Sung Koo Lee, Cheol Kyu Bok

Proceedings Volume 7273, 727318 (2009) https://doi.org/10.1117/12.816448

KEYWORDS: Reflectivity, Double patterning technology, Immersion lithography, Multilayers, Silicon, Interfaces, Optical lithography, Lithography, Etching, Control systems

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Proceedings Article | 4 December 2008 Paper

Study on imaging characterization of ArF high index immersion lithography

Sarohan Park, Jun-Taek Park, Kilyoung Lee, Tae-Seung Eom, Jin-Soo Kim, Hyeong-Soo Kim, Seung-Chan Moon

Proceedings Volume 7140, 71401K (2008) https://doi.org/10.1117/12.804651

KEYWORDS: Photomasks, Optical lithography, Reflectivity, Immersion lithography, Lithography, Image processing, Image enhancement, Polarization, Semiconducting wafers, Transmittance

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Proceedings Article | 26 March 2008 Paper

Optimization of BARC process for hyper-NA immersion lithography

Kilyoung Lee, Junghyung Lee, Sungkoo Lee, Dongheok Park, Cheolkyu Bok, Seungchan Moon

Proceedings Volume 6923, 69232R (2008) https://doi.org/10.1117/12.771957

KEYWORDS: Reflectivity, Photoresist materials, Etching, Immersion lithography, System on a chip, Lithography, Polarization, Carbon, Process control, Polymers

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Proceedings Article | 26 March 2008 Paper

Development of new BARC for immersion process using hyper NA

Hyo Jung Roh, Man Ho Han, Sang Jeoung Kim, Hyun Jin Kim, Jaehyun Kim, Keun Kyu Kong, Ki Lyoung Lee, Sung Koo Lee, Dong Heok Park

Proceedings Volume 6923, 69232T (2008) https://doi.org/10.1117/12.776801

KEYWORDS: Reflectivity, Etching, Refractive index, Semiconductors, Photoresist processing, Polymers, Lithography, Photorefractive polymers, Photoresist materials, Materials processing

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Proceedings Article | 30 March 2007 Paper

Optimization of material and process parameter for minimizing defect in implementation of MFHM process

Kilyoung Lee, Junggun Heo, Keundo Ban, Hyungsuk Seo, Geunsu Lee, Wonkyu Kim, Junhee Cho, Junhyeub Sun, Sungkwon Lee, Cheolkyu Bok, Seungchan Moon, Jinwoong Kim

Proceedings Volume 6519, 65192Y (2007) https://doi.org/10.1117/12.712406

KEYWORDS: Etching, System on a chip, Silicon, Coating, Lithography, Materials processing, Carbon, Particles, Photoresist processing, Photomasks

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Proceedings Article | 11 April 2006 Paper

Development of multi-function hard mask to simplify process step

Kilyoung Lee, Samyoung Kim, Geunsu Lee, Sungkwon Lee, Junhee Cho, Wonkyu Kim, Cheolkyu Bok, Hyeongsoo Kim, Seungchan Moon, Jinwoong Kim

Proceedings Volume 6153, 61532V (2006) https://doi.org/10.1117/12.656870

KEYWORDS: Etching, System on a chip, Photoresist materials, Photomasks, Silicon, Lithography, Reflectivity, Photoresist processing, Chemistry, Carbon

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Proceedings Article | 24 March 2006 Paper

Improvement of alignment and overlay accuracy on amorphous carbon layers

Young-Sun Hwang, Eung-kil Kang, Ki-lyoung Lee, Keun-Do Ban, Cheol-Kyu Bok, Chang-Moon Lim, Hyeong-Soo Kim, Seung-Chan Moon

Proceedings Volume 6152, 615222 (2006) https://doi.org/10.1117/12.656416

KEYWORDS: Optical alignment, Etching, Carbon, Absorption, Photomasks, Reflection, Lithography, Resolution enhancement technologies, Photoresist processing, Optical lithography

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Proceedings Article | 4 May 2005 Paper

0.31k1 ArF lithography for 70-nm DRAM

Cheolkyu Bok, Ki-Lyoung Lee, Jun-Taek Park, Young-Sun Hwang, Tae-Seung Eom, Seo-Min Kim, Geunsu Lee, Jae-Chang Jung, Chang-Moon Lim, Seung-Chan Moon, Jin-Woong Kim

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599348

KEYWORDS: Lithography, Photoresist processing, Photomasks, Optical proximity correction, Lithographic illumination, Resolution enhancement technologies, Electroluminescence, Image processing, Etching, Semiconducting wafers

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Showing 5 of 13 publications

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