Mr. Yuya Kamei Profile

Yuya Kamei

at Tokyo Electron Kyushu Ltd

SPIE Involvement:

Author

Publications (17)

Proceedings Article | 1 May 2023 Poster + Paper

Poster + Paper

Establishment of new process technology for EUV lithography

Yuhei Kuwahara, Shinichiro Kawakami, Kanzo Kato, Soichiro Okada, Yuya Kamei, Tomoya Onitsuka, Takashi Yamauchi, Nanoka Miyahara, Congque Dinh, Lior Huli, Satoru Shimura

Proceedings Volume 12498, 124981F (2023) https://doi.org/10.1117/12.2657076

KEYWORDS: Solubility, Etching, Silicon, Scanning electron microscopy, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, High volume manufacturing, Silicon carbide, Line edge roughness

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Proceedings Article | 11 November 2022 Presentation

Presentation

Holistic litho-etch development to address patterning challenges towards high NA EUV

Arnaud Dauendorffer, Tomoya Onitsuka, Hisashi Genjima, Noriaki Nagamine, Yuhei Kuwahara, Yuya Kamei, Shinichiro Kawakami, Makoto Muramatsu, Satoru Shimura, Kathleen Nafus, Noriaki Oikawa, Yannick Feurprier, Marc Demand, Xiang Liu, Seiji Nagahara, Philippe Foubert, Danilo De Simone, Sophie Thibaut, Steven Grzeskowiak, Katie Lutker-Lee, Eric Liu, Christopher Catano, Joshua LaRose, Jeffrey Shearer, Lior Huli, Alexandra Krawicz

Proceedings Volume PC12292, PC122920N (2022) https://doi.org/10.1117/12.2642941

KEYWORDS: Lithography, Optical lithography, Etching, Photoresist materials, Extreme ultraviolet, Plasma etching, Extreme ultraviolet lithography, Yield improvement, Stochastic processes, Plasma

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Proceedings Article | 25 May 2022 Poster + Paper

Poster + Paper

Metal oxide resist (MOR) EUV lithography processes for DRAM application

Jong Eun Park, Sang Ho Lee, Jin il Kim, Jang Hwan Kim, Shinichiro Kawakami, Tomoya Onitsuka, Yuya Kamei, Satoru Shimura, Chan Ha Park, Jae Wook Seo, Ki Lyoung Lee, Jin Hyung Kim, Hong Goo Lee, Jun ho Roh, Seiji Nagahara, Jeoung Yun Kim, Shingo Inaba

Proceedings Volume 12055, 120550N (2022) https://doi.org/10.1117/12.2613974

KEYWORDS: Oxides, Optical lithography, Contamination, Metals, Coating, Manufacturing, Bridges, Extreme ultraviolet lithography, Semiconducting wafers, Contamination control

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Proceedings Article | 25 May 2022 Poster + Paper

Poster + Paper

Novel technologies in coater/developer to improve the defectivity for advanced EUV patterning materials

Yuya Kamei, Tomoya Onitsuka, Takashi Yamauchi, Takahiro Shiozawa, Yuhei Kuwahara, Shinichiro Kawakami, Seiji Fujimoto, Arisa Hara, Satoru Shimura

Proceedings Volume 12055, 120550O (2022) https://doi.org/10.1117/12.2613643

KEYWORDS: Lithography, Optical lithography, Etching, Metals, Particles, Bridges, Extreme ultraviolet, Silicon carbide, Photoresist processing, Semiconducting wafers

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Proceedings Article | 28 September 2021 Presentation

Presentation

Addressing EUV patterning challenges towards the limits of NA 0.33 EUV exposure

Noriaki Oikawa, Yannick Feurprier, Marc Demand, Ainhoa Romo Negreira, Seiji Nagahara, Congque Dinh, Luka Kljucar, Danilo De Simone, Philippe Foubert, Arnaud Dauendorffer, Tomoya Onitsuka, Hiroki Tadatomo, Keisuke Yoshida, Takahiro Shiozawa, Hisashi Genjima, Noriaki Nagamine, Yuya Kamei, Soichiro Okada, Shinichiro Kawakami, Makoto Muramatsu, Satoru Shimura, Kathleen Nafus

Proceedings Volume 11854, 118540B (2021) https://doi.org/10.1117/12.2600860

KEYWORDS: Semiconductors, Optical lithography, Etching, Metals, Particles, Resistance, Photomasks, Semiconductor manufacturing, Extreme ultraviolet lithography, Stochastic processes

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Proceedings Article | 23 March 2020 Paper

Paper

CLEAN TRACK solutions for defectivity and CD control towards 5 nm and smaller nodes

Arnaud Dauendorffer, Takahiro Shiozawa, Keisuke Yoshida, Noriaki Nagamine, Yuya Kamei, Shinichiro Kawakami, Satoru Shimura, Kathleen Nafus, Akihiro Sonoda, Philippe Foubert

Proceedings Volume 11323, 113232A (2020) https://doi.org/10.1117/12.2551627

KEYWORDS: Etching, Photoresist materials, Bridges, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Stochastic processes

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Proceedings Article | 7 October 2019 Paper

Paper

New coater/developer technologies for CD control and defectivity reduction towards 5 nm and smaller nodes

Arnaud Dauendorffer, Yuya Kamei, Shinichiro Kawakami, Makoto Muramatsu, Kathleen Nafus, Akihiro Sonoda, Philippe Foubert

Proceedings Volume 11147, 111471N (2019) https://doi.org/10.1117/12.2536470

KEYWORDS: Lithography, Scanners, Silicon, Inspection, Bridges, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Stochastic processes

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Proceedings Article | 8 April 2019 Paper

Paper

PSCAR optimization to reduce EUV resist roughness with sensitization using Resist Formulation Optimizer (RFO)

Hans-Jürgen Stock, Yukie Minekawa, Peter De Bisschop, Seiji Nagahara, Cong Que Dinh, Gosuke Shiraishi, Yuya Kamei, Michael Carcasi, Hiroyuki Ide, Yoshihiro Kondo, Yuichi Yoshida, Kosuke Yoshihara, Ryo Shimada, Masaru Tomono, Kazuhiro Takeshita, Kathleen Nafus, Serge Biesemans, Hideo Nakashima, John Petersen, Danilo De Simone, Philippe Foubert, Geert Vandenberghe, Balint Meliorisz

Proceedings Volume 10960, 109600A (2019) https://doi.org/10.1117/12.2515187

KEYWORDS: Switching, Calibration, 3D modeling, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Stochastic processes

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Proceedings Article | 26 March 2019 Paper

Paper

Novel technologies in coater/developer to enhance the CD stability and to improve the defectivity toward N7 and smaller nodes

Yuya Kamei, Shinichiro Kawakami, Masahide Tadokoro, Yohei Sano, Masashi Enomoto, Kathleen Nafus, Akihiro Sonoda, Marc Demand, Philippe Foubert, Takashi Yamauchi, Makoto Muramatsu

Proceedings Volume 10957, 109571P (2019) https://doi.org/10.1117/12.2514930

KEYWORDS: Scanners, Particles, Coating, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Stochastic processes

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Proceedings Article | 26 March 2019 Paper

Paper

Calibrated PSCAR stochastic simulation

Cong Que Dinh, Seiji Nagahara, Gousuke Shiraishi, Yuya Kamei, Michael Carcasi, Yoshihiro Kondo, Kosuke Yoshihara, Ryo Shimada, Masaru Tomono, Kazuhiro Takeshita, Kathleen Nafus, Serge Biesemans, John Petersen, Danilo De Simone, Philippe Foubert, Peter De Bisschop, Geert Vandenberghe, Hans-Jürgen Stock, Balint Meliorisz, Hiroyuki Ide, Yuichi Yoshida, Yukie Minekawa, Teruhiko Moriya

Proceedings Volume 10957, 109571O (2019) https://doi.org/10.1117/12.2515183

KEYWORDS: Data modeling, Calibration, Ultraviolet radiation, Scanning electron microscopy, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Modeling and simulation, Stochastic processes

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Proceedings Article | 10 October 2018 Paper

Paper

Improvement of CD stability and defectivity in resist coating and developing process in EUV lithography process

Yuya Kamei, Shinichiro Kawakami, Masahide Tadokoro, Yusaku Hashimoto, Takeshi Shimoaoki, Masashi Enomoto, Kathleen Nafus, Akihiro Sonoda, Philippe Foubert

Proceedings Volume 10809, 1080924 (2018) https://doi.org/10.1117/12.2500896

KEYWORDS: Scanners, Particles, Coating, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Stochastic processes, System on a chip

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Proceedings Article | 27 March 2018 Presentation + Paper

Presentation + Paper

EUV resist sensitization and roughness improvement by PSCAR with in-line UV flood exposure system

Michael Carcasi, Tomoki Nagai, Motoyuki Shima, Toru Kimura, Takehiko Naruoka, Masafumi Hori, Satoshi Dei, Geert Vandenberghe, Seiichi Tagawa, Masayuki Miyake, Seiji Nagahara, Gosuke Shiraishi, Yukie Minekawa, Hiroyuki Ide, Yoshihiro Kondo, Kosuke Yoshihara, Ryo Shimada, Masaru Tomono, Kazuhiro Takeshita, Teruhiko Moriya, Hayakawa Makoto, Ryo Aizawa, Yoshitaka Konishi, Takahiro Shiozawa, Kathleen Nafus, Serge Biesemans, Hideo Nakashima, Hisashi Nakagawa, Danilo De Simone, Foubert Philippe, Akihiro Oshima, Yuya Kamei, Keisuke Yoshida, Masashi Enomoto, Ken Maruyama, John Petersen, Hans-Jürgen Stock, Balint Meliorisz

Proceedings Volume 10586, 1058606 (2018) https://doi.org/10.1117/12.2297498

KEYWORDS: Calibration, Polymers, Ultraviolet radiation, Extreme ultraviolet, Image enhancement, Extreme ultraviolet lithography, Picosecond phenomena, Floods, Absorption, Chemically amplified resists

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Proceedings Article | 27 March 2018 Presentation + Paper

Presentation + Paper

Constructing a robust PSCAR process for EUV

Michael Carcasi, Seiji Nagahara, Gosuke Shiraishi, Yukie Minekawa, Hiroyuki Ide, Kosuke Yoshihara, Masaru Tomono, Ryo Shimada, Geert Vandenberghe, Danilo De Simone, Philippe Foubert, Akihiro Oshima, Seiichi Tagawa, Kazuhiro Takeshita, Teruhiko Moriya, Yuya Kamei, Kathleen Nafus, Serge Biesemans, Hideo Nakashima, Hisashi Nakagawa, Takehiko Naruoka, Tomoki Nagai, Masafumi Hori, Satoshi Dei, Ken Maruyama, Yoshihiro Kondo, Masayuki Miyake, Motoyuki Shima, John Petersen

Proceedings Volume 10583, 105831M (2018) https://doi.org/10.1117/12.2297370

KEYWORDS: Optical lithography, Image processing, Ultraviolet radiation, Extreme ultraviolet, Absorbance, Extreme ultraviolet lithography, Picosecond phenomena, Line edge roughness, Absorption, Chemically amplified resists

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Proceedings Article | 19 March 2018 Paper

Paper

Resist coating and developing process technology toward EUV manufacturing sub-7nm node

Shinichiro Kawakami, Hideo Shite, Masashi Enomoto, Hiroshi Ichinomiya, Kathleen Nafus, Philippe Foubert, Yusaku Hashimoto, Marc Demand, Yuya Kamei, Takahiro Shiozawa, Akihiro Sonoda

Proceedings Volume 10583, 105831V (2018) https://doi.org/10.1117/12.2297203

KEYWORDS: Particles, Coating, Manufacturing, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Yield improvement, System on a chip

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Proceedings Article | 16 October 2017 Paper

Paper

Technology for defectivity improvement in resist coating and developing process in EUV lithography process

Yuya Kamei, Takahiro Shiozawa, Shinichiro Kawakami, Hiroshi Ichinomiya, Masashi Enomoto, Kathleen Nafus, Philippe Foubert

Proceedings Volume 10450, 104501F (2017) https://doi.org/10.1117/12.2280388

KEYWORDS: Scanners, Coating, Manufacturing, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, High volume manufacturing, Neodymium, Photoresist processing, Semiconducting wafers

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Proceedings Article | 27 March 2017 Paper

Paper

Technology for defectivity improvement in resist coating and developing process in EUV lithography process

Yuya Kamei, Hideo Shite, Philippe Foubert, Kathleen Nafus, Shinichiro Kawakami, Hiroshi Ichinomiya, Masashi Enomoto, Takahiro Shiozawa, Marc Demand

Proceedings Volume 10143, 1014326 (2017) https://doi.org/10.1117/12.2257931

KEYWORDS: Particles, Silicon, Coating, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Neodymium, Photoresist processing, Semiconducting wafers, System on a chip

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Proceedings Article | 27 March 2017 Presentation + Paper

Presentation + Paper

Photosensitized Chemically Amplified Resist (PSCAR) 2.0 for high-throughput and high-resolution EUV lithography: dual photosensitization of acid generation and quencher decomposition by flood exposure

Takahiro Shiozawa, Seiji Nagahara, Michael Carcasi, Gosuke Shiraishi, Yuya Kamei, Yukie Minekawa, Tomohiro Iseki, Kosuke Yoshihara, Masaru Tomono, Ryo Shimada, Kathleen Nafus, Serge Biesemans, Hideo Nakashima, Hisashi Nakagawa, Takehiko Naruoka, Tomoki Nagai, Masafumi Hori, Satoshi Dei, Geert Vandenberghe, Danilo De Simone, Philippe Foubert, Elizabeth Buitrago, Michaela Vockenhuber, Yasin Ekinci, Akihiro Oshima, Seiichi Tagawa, Hans-Jürgen Stock, Bernd Küchler, Yoshihiro Kondo

Proceedings Volume 10146, 101460G (2017) https://doi.org/10.1117/12.2258217

KEYWORDS: Lithography, Polymers, Image processing, Scanners, Ultraviolet radiation, Extreme ultraviolet, Line width roughness, Image enhancement, Extreme ultraviolet lithography, Picosecond phenomena, Line edge roughness, Stochastic processes, Floods, Chemically amplified resists

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Showing 5 of 17 publications

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